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Christophe Pierrat

Automated optical proximity correction: a rules-based approach
1994 · Oberdan W. Otto, Joseph G. Garofalo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 85
Positive resist image by dry etching: New dry developed positive working system for electron beam and deep ultraviolet lithography
1989 · C. Pierrat, S. Tedesco, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 34
Exposure characteristics of alternate aperture phase-shifting masks fabricated using a subtractive process
1992 · R. L. Kostelak, C. Pierrat, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 24
Multiple-layer blank structure for phase-shifting mask fabrication
1996 · Christophe Pierrat, Theo Siegrist, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
Impact of model-based fracturing on e-beam proximity effect correction methodology
2010 · Christophe Pierrat, Ingo Bork · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Phase-shifting mask topography effects on lithographic image quality
1993 · Christophe Pierrat, Alfred K. K. Wong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
PRIME process for deep UV and E-beam lithography
1990 · C. Pierrat, S. Tedesco, et al. · Microelectronic Engineering · 12
Efficiently writing circular contacts on production reticle
2010 · Aki Fujimura, Christophe Pierrat, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
New alternating phase-shifting mask conversion methodology using phase conflict resolution
2002 · Christophe Pierrat, Michel L. Cote, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Mesures picoseconde avec des couches polycristallines de CdTe photoconducteur
1989 · M. Cuzin, C. Pierrat, et al. · Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 9
Pellicle-induced aberrations and apodization in hyper-NA optical lithography
2006 · Karsten Bubke, Benjamin Alles, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
ANR photoresist process optimization at 248 nm
1990 · Christophe Pierrat, Francoise Vinet, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Writing 32nm-hp contacts with curvilinear assist features
2010 · Aki Fujimura, David Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
MEF revisited: low k 1 effects versus mask topography effects
2003 · Christophe Pierrat, Alfred K. K. Wong · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Mask data correction methodology in the context of model-based fracturing and advanced mask models
2011 · Christophe Pierrat, Larry Chau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Characterization of dry developed processes using silylation application to the PRIME process
1990 · Christophe Pierrat, Hubert Bono, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Automatic proximity correction for 0.35 μm I-line photolithography
2002 · J. Garofalo, K.K. Low, et al. · Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits (NUPAD) · 5
Full phase-shifting methodology for 65-nm node lithography
2003 · Christophe Pierrat, Frank A. J. M. Driessen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Analyzing deep-UV lens aberrations using aerial image and latent image metrologies
1994 · Eric L. Raab, Christophe Pierrat, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Dry etched molybdenum silicide photomasks for submicron integrated circuit fabrication
1991 · C. Pierrat, R. G. Tarascon, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 4
Dry etching for high-resolution maskmaking
1990 · Serge V. Tedesco, Christophe Pierrat, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results
1999 · Robert J. Socha, Xuelong Shi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Required optical characteristics of materials for phase-shifting masks
1995 · C. Pierrat, S. Vaidya · Applied Optics · 2
Implementing Attenuated Phase Shift Masks for Contacts in Production
1994 · Chi-Min Yuan, Victor Pol, et al. · Japanese Journal of Applied Physics · 2
Rule-based approach to e-beam and process-induced proximity effect correction for phase-shifting mask fabrication
1994 · Christophe Pierrat, Joseph G. Garofalo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Works count: 48
Citation count: 307
H-index: 9
I10-index: 8
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