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Kazuki Miwa

Simple wet-etching technology for GaN using an electrodeless photo-assisted electrochemical reaction with a luminous array film as the UV source
2019 · Fumimasa Horikiri, Noboru Fukuhara, et al. · Applied Physics Express · 29
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Electrodeless photo-assisted electrochemical etching of GaN using a H3PO4-based solution containing S2O8 2– ions
2019 · Masachika Toguchi, Kazuki Miwa, et al. · Applied Physics Express · 24
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Self-termination of contactless photo-electrochemical (PEC) etching on aluminum gallium nitride/gallium nitride heterostructures
2020 · Kazuki Miwa, Yuto Komatsu, et al. · Applied Physics Express · 17
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Thermal-assisted contactless photoelectrochemical etching for GaN
2020 · Fumimasa Horikiri, Noboru Fukuhara, et al. · Applied Physics Express · 10
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Photoelectrochemical Etching Technology for Gallium Nitride Power and RF Devices
2019 · Fumimasa Horikiri, Taketomo Sato, et al. · IEEE Transactions on Semiconductor Manufacturing · 10
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Self-terminating contactless photo-electrochemical (CL-PEC) etching for fabricating highly uniform recessed-gate AlGaN/GaN high-electron-mobility transistors (HEMTs)
2021 · Masachika Toguchi, Kazuki Miwa, et al. · Journal of Applied Physics · 8
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Fabrication of GaN nanowires containing n+-doped top layer by wet processes using electrodeless photo-assisted electrochemical etching and alkaline solution treatment
2021 · Michihito Shimauchi, Kazuki Miwa, et al. · Applied Physics Express · 6
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Communication—Anisotropic Electrochemical Etching of Porous Gallium Nitride by Sub-Bandgap Absorption Due to Franz-Keldysh Effect
2019 · Masachika Toguchi, Kazuki Miwa, et al. · Journal of The Electrochemical Society · 2
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Cathode-electrode on photoelectrochemical (PEC) etching for n-GaN on n+GaN substrate
2021 · Noboru Fukuhara, Fumimasa Horikiri, et al. · The Japan Society of Applied Physics
Fabrication of Recessed-Gate AlGaN/GaN Hemts Utilizing Contactless Photo-Electrochemical (CL-PEC) Etching
2020 · Masachika Toguchi, Kazuki Miwa, et al. · ECS Meeting Abstracts
Thermal assisted contactless photoelectrochemical (PEC) etching for GaN
2020 · Fumimasa Horikiri, Noboru Fukuhara, et al. · The Japan Society of Applied Physics
Thermal-assisted generation of sulfate radicals for contactless photo electrochemical (PEC) etching of n-GaN
2020 · Kazuki Miwa, Hiroki Ogami, et al. · The Japan Society of Applied Physics
コンタクトレス光電気化学(pec)エッチングを用いたリセスゲートhemtの作製
2020 · 文正 堀切, 昇 福原, et al. · IEICE Technical Report; IEICE Tech. Rep.
Simple Photoelectrochemical Etching for Recess Gate GaN HEMT
2020 · Fumimasa Horikiri, Noboru Fukuhara, et al. · IEICE Technical Report; IEICE Tech. Rep.
Contactless Photoelectrochemical Etching of n-GaN in K 2 S 2 O 8 /H 3 PO 4 Mixed Solution
2019 · Masachika Toguchi, Kazuki Miwa, et al. · The Japan Society of Applied Physics
Fabrication GaN nanowires by electrodeless photo-assisted electrochemical etching and wet etching
2019 · Michihito Shimauchi, Kazuki Miwa, et al. · The Japan Society of Applied Physics
Works count: 16
Citation count: 106
H-index: 6
I10-index: 5
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