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Kazuhiro Takeshita
Observed name:
K. Takeshita
Institution:
Tokyo Electron Kyushu Ltd (Japan)
Observed institutions:
Tokyo Electron (Japan),
Tokyo Electron Kyushu Ltd (Japan),
SAN Nopco Limited (Japan)
OpenAlex ID:
A5109063224
Calibrated PSCAR stochastic simulation
2019
·
Cong Que Dinh
, Seiji Nagahara
, et al.
·
Extreme Ultraviolet (EUV) Lithography
·
6
Model of coating and drying process for flat polymer film fabrication
2002
·
Hiroyuki Kagami
, Ryuji Miyagawa
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
EUV resist sensitization and roughness improvement by PSCAR with in-line flood exposure system (Conference Presentation)
2018
·
Michael Carcasi
, Tomoki Nagai
, et al.
·
Advances in Patterning Materials and Processes
·
2
Thickness Uniformity of Spin Coated Film Influenced by Nonuniform Temperature of Substrates
2010
·
Taku Ohara
, Shinichiro Matsubara
, et al.
·
International Journal of Emerging Multidisciplinary Fluid Sciences
·
1
First photomask developer based on state-of-the-art wafer processing technology
2004
·
Peter Tichy
, Takahiro Fukai
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Optimum drying method for scan coating
2002
·
S. Kobayashi
, T. Kitano
, et al.
·
IEEE International Symposium on Semiconductor Manufacturing conference proceedings
·
1
Performances of Novel Nozzle-Scan Coating Method
2000
·
Shinichi Ito
, Tatsuhiko Ema
, et al.
·
Japanese Journal of Applied Physics
·
1
PDF
Lubricant for Paper Coating
1999
·
Kazuhiro Takeshita
·
JAPAN TAPPI JOURNAL
·
1
PDF
Flow and Heat Transfer Characteristics in a Two-Phase Loop Thermosyphon:The Case Where an Evaporator Has Three Heated Tubes
1994
·
Hideaki Imura
, Kazuhiro Takeshita
, et al.
·
1
Reduction of TOCL Contaminants in Polyaminoamide Epichlorohydrin Wet Strength Resins.
1992
·
Kazuhiro Takeshita
·
JAPAN TAPPI JOURNAL
·
1
PDF
PSCAR optimization to reduce EUV resist roughness with sensitization using Resist Formulation Optimizer (RFO) (Conference Presentation)
2019
·
Seiji Nagahara
, Cong Que Dinh
, et al.
·
Advances in Patterning Materials and Processes
Constructing a robust PSCARTM process for EUV (Conference Presentation)
2018
·
Michael A. Carcasi
, Seiji Nagahara
, et al.
·
Extreme Ultraviolet (EUV) Lithography
The performances of the novel nozzle-scan coating method
2002
·
S. Ito
, T. Ema
, et al.
·
International Microprocesses and Nanotechnology Conference (MNC)
Novel Nozzle-Scan Coating Method for Low-k Films
2000
·
R. Nakata
, N. Yamada
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
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Works count:
14
Citation count:
20
H-index:
2
I10-index:
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