Product
Help
Pricing
About
Jobs
Log in
Get started
Author
Add to collection
J.-L. Ogier
Observed names:
J-L. Ogier,
J-Luc Ogier,
J. -L. Ogier,
J. L. Ogier,
J.L. Ogier,
Ogier, J.-L.
show all 6
Institution:
STMicroelectronics (France)
Observed institutions:
Centre National de la Recherche Scientifique,
Orange (France),
Aix-Marseille Université,
STMicroelectronics (France),
Institut des Matériaux, de Microélectronique et des Nanosciences de Provence,
IMEC,
Université de Provence Aix-Marseille I
show all 7
OpenAlex ID:
A5109438235
New insights in the relation between electron trap generation and the statistical properties of oxide breakdown
1998
·
R. Degraeve
, G. Groeseneken
, et al.
·
IEEE Transactions on Electron Devices
·
676
A new model for the field dependence of intrinsic and extrinsic time-dependent dielectric breakdown
1998
·
R. Degraeve
, J.L. Ogier
, et al.
·
IEEE Transactions on Electron Devices
·
132
Truly Innovative 28nm FDSOI Technology for Automotive Micro-Controller Applications embedding 16MB Phase Change Memory
2018
·
F. Arnaud
, P. Zuliani
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
95
High Density Embedded PCM Cell in 28nm FDSOI Technology for Automotive Micro-Controller Applications
2020
·
F. Arnaud
, P. Ferreira
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
54
On the field dependence of intrinsic and extrinsic time-dependent dielectric breakdown
1996
·
R. Degraeve
, J.L. Ogier
, et al.
·
IEEE International Reliability Physics Symposium proceedings
·
49
Soft errors induced by natural radiation at ground level in floating gate flash memories
2013
·
G. Just
, J. L. Autran
, et al.
·
IEEE International Reliability Physics Symposium proceedings
·
21
Push the flash floating gate memories toward the future low energy application
2012
·
V. Della Marca
, G. Just
, et al.
·
Solid-State Electronics
·
18
A new polarity dependence of the reduced trap generation during high-field degradation of nitrided oxides
2002
·
R. Degraeve
, J. De Blauwe
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
17
Impact of endurance degradation on the programming efficiency and the energy consumption of NOR flash memories
2014
·
V. Della Marca
, J. Postel-Pellerin
, et al.
·
Microelectronics Reliability
·
16
Matching degradation of threshold voltage and gate voltage of NMOSFET after Hot Carrier Injection stress
2011
·
Y. Joly
, L. Lopez
, et al.
·
Microelectronics Reliability
·
16
A new statistical model for fitting bimodal oxide breakdown distributions at different field conditions
1996
·
R. Degraeve
, Ph. Roussel
, et al.
·
Microelectronics Reliability
·
9
Data retention under gate stress on a NVM array
2012
·
R. Djenadi
, G. Micolau
, et al.
·
Solid-State Electronics
·
8
Octagonal MOSFET: Reliable device for low power analog applications
2011
·
Y. Joly
, L. Lopez
, et al.
·
European Solid-State Device Research Conference
·
8
Assessment of temperature and voltage accelerating factors for 2.3–3.2nm SiO2 thin oxides stressed to hard breakdown
2007
·
D. Pic
, D. Goguenheim
, et al.
·
Microelectronics Reliability
·
8
Oxide reliability below 3nm for advanced CMOS: Issues, characterization, and solutions
2007
·
D. Goguenheim
, D. Pic
, et al.
·
Microelectronics Reliability
·
8
On the Polarity Dependence of Oxide Breakdown in MOS-Devices with N+ and P+ Polysilicon Gate
1996
·
J.-L. Ogier
, R. Degraeve
, et al.
·
European Solid-State Device Research Conference
·
7
Effect of AC stress on oxide TDDB and trapped charge in interface states
2014
·
B. Rebuffat
, P. Masson
, et al.
·
International Symposium on Integrated Circuits
·
6
Experimental study to push the Flash floating gate memories toward low energy applications
2011
·
V. Della Marca
, A. Regnier
, et al.
·
International Semiconductor Device Research Symposium
·
6
An experimental method allowing quantifying and localizing failed cells of an EEPROM CAST after a retention test
2008
·
C. Le Roux
, L. Lopez
, et al.
·
Solid-State Electronics
·
6
A new method to quantify retention-failed cells of an EEPROM CAST
2007
·
C. Le Roux
, L. Lopez
, et al.
·
Microelectronics Reliability
·
6
Degradation mechanism during gate stress at high electrical field on high voltage MOSFET for non-volatile memory applications
2014
·
M. Carmona
, L. Lopez
, et al.
·
IEEE International Integrated Reliability Workshop final report
·
5
An evaluation of the extrinsic cells number in a memory array using cross-correlation products and deconvolution: an instance of a microelectronics experimental inverse problem
2011
·
G. Micolau
, J. Postel-Pellerin
, et al.
·
Inverse Problems in Science and Engineering
·
5
PDF
Analysis of the Early-Failure Rate Prediction of Time-Dependent-Dielectric Breakdown in Thin Oxides
1995
·
J.-L. Ogier
, R. Degraeve
, et al.
·
European Solid-State Device Research Conference
·
5
Relaxation effect on cycling on NOR flash memories
2015
·
B. Rebuffat
, J-L. Ogier
, et al.
·
IEEE International Conference on Electron Devices and Solid-State Circuits (EDSSC)
·
4
Access resistor modelling for EEPROM’s retention test vehicle
2013
·
P. Canet
, J. Postel-Pellerin
, et al.
·
Microelectronics Reliability
·
4
Show more works
View as search
Works count:
47
Citation count:
1,232
H-index:
10
I10-index:
10
Year
Topic
Type