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Yusuke Komura

Preparation of nanocrystalline cubic silicon carbide thin films by hot-wire CVD at various filament-to-substrate distances
2007 · Akimori Tabata, Yusuke Komura · Surface and Coatings Technology · 27
Film Properties of Nanocrystalline 3C–SiC Thin Films Deposited on Glass Substrates by Hot-Wire Chemical Vapor Deposition Using CH4 as a Carbon Source
2007 · Yusuke Komura, Akimori Tabata, et al. · Japanese Journal of Applied Physics · 26
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Influence of gas pressure on low-temperature preparation and film properties of nanocrystalline 3C-SiC thin films by HW-CVD using SiH4/CH4/H2 system
2007 · Yusuke Komura, Akimori Tabata, et al. · Thin Solid Films · 24
Growth of silicon carbide thin films by hot-wire chemical vapor deposition from SiH4/CH4/H2
2009 · Akimori Tabata, Yusuke Komura, et al. · Thin Solid Films · 18
Properties of Nanocrystalline Cubic Silicon Carbide Thin Films Prepared by Hot-Wire Chemical Vapor Deposition Using SiH4/CH4/H2 at Various Substrate Temperatures
2008 · Akimori Tabata, Yusuke Komura, et al. · Japanese Journal of Applied Physics · 14
Importance of H2 gas for growth of hot-wire CVD nanocrystalline 3C-SiC from SiH4/CH4/H2
2009 · Yoshiki Hoshide, Yusuke Komura, et al. · Thin Solid Films · 13
1-Mbit 3-D DRAM Using a Monolithically Stacked Structure of a Si CMOS and Heterogeneous IGZO FETs
2024 · Takeya Hirose, Yuki Okamoto, et al. · IEEE Journal of the Electron Devices Society · 12
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32‐3: 1.5‐inch, 3207‐ppi Side‐by‐Side OLED Display Capable of 32‐Division Driving with OSLSI/SiLSI Structure Fabricated by Photolithography
2022 · Munehiro Kozuma, Yuki Okamoto, et al. · SID Symposium Digest of Technical Papers · 12
Heterogeneous Oxide Semiconductor FETs Comprising Planar FET and Vertical Channel FETs Monolithically Stacked on Si CMOS, Enabling 1-Mbit 3D DRAM
2024 · Hiroki Inoue, Takeya Hirose, et al. · IEEE International Memory Workshop (IMW) · 6
OLED Microdisplay With Monolithically Integrated CAAC-OS FET and Si CMOS Achieved by Two-Dimensionally Arranged Silicon Display Drivers
2024 · Munehiro Kozuma, Yusuke Komura, et al. · IEEE Journal of the Electron Devices Society · 5
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Demonstration of scaling and monolithic stacking for higher integration of integrated circuit using c-axis aligned crystalline oxide semiconductor FET
2024 · Hiromi Sawai, Motomu Kurata, et al. · Japanese Journal of Applied Physics · 3
P‐151: Late‐News Poster: 1.5‐inch, 3207‐ppi Foveated Display with OLED/OS/Si Structure Capable of 32‐Division Control of Resolution and Frame Rate
2023 · Yuki Tamatsukuri, Shoki Miyata, et al. · SID Symposium Digest of Technical Papers · 3
Preparation of Nanocrystalline Silicon Carbide Thin Films by Hot-Wire Chemical Vapor Deposition at Various Filament Temperature
2006 · Akimori Tabata, Yusuke Komura, et al. · World Conference on Photovoltaic Energy Conversion · 3
Two-Dimensionally Arranged Display Drivers Achieved by OS/Si Structure
2023 · Yusuke Komura, Shoki Miyata, et al. · IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) · 1
Feasibility Study for 32-level cell using Memory with 13.5-V 0.5-um OSFET Monolithically Stacked on 13.5-V 1.6-um CMOSFET
2022 · Hiroki Inoue, Shoki Miyata, et al. · International Conference on Solid State Devices and Materials (SSDM)
NAND Memory Composed of Crystalline In-Ga-Zn Oxide FETs with Endurance of over 1013 Cycles at 20-ns Write Time without Batch Erase
2022 · Shoki Miyata, Satoru Oshita, et al. · International Conference on Solid State Devices and Materials (SSDM)
Works count: 16
Citation count: 167
H-index: 8
I10-index: 8
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