Get started
Author

Edward K. Pavelchek

Observed names: E. K. Pavelchek, E. Pavelchek, E.K. Pavelchek, EK Pavelchek, Edward K. Pavelcheck, Edward K. Pavelchek,
OpenAlex ID: A5109941653
Channel‐Constrained Electroless Metal Deposition on Ligating Self‐Assembled Film Surfaces
1999 · Mu‐San Chen, Susan L. Brandow, et al. · Journal of The Electrochemical Society · 56
PDF
Fracture strength of soda-lime glass after etching
1974 · E. K. Pavelchek, R. H. Doremus · Journal of Materials Science · 45
Deep UV ANR Photoresists For 248 nm Excimer Laser Photolithography
1989 · James W. Thackeray, George W. Orsula, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 29
Static fatigue in glass — A reappraisal
1976 · E.K. Pavelchek, R.H. Doremus · Journal of Non-Crystalline Solids · 29
Dissolution inhibition mechanism of ANR photoresists: crosslinking vs. -OH site consumption
1991 · James W. Thackeray, George W. Orsula, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
Photoresist channel-constrained deposition of electroless metallization on ligating self-assembled films
1994 · Jeffrey M. Calvert, Gary S. Calabrese, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 20
Griffith fracture equation—An experimental test
1975 · R. H. Doremus, E. K. Pavelchek · Journal of Applied Physics · 15
Improved notch model for resist dissolution in lithography simulation
2001 · Stewart A. Robertson, Edward K. Pavelchek, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Silylated acid hardened resist process: A deep ultraviolet surface imaging technique
1990 · Edward K. Pavelchek, John F. Bohland, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 10
Some resists based on chemically-amplified crosslinking of phenolic polymers.
1990 · John F. Bohland, Gary S. Calabrese, et al. · Journal of Photopolymer Science and Technology · 9
PDF
Processing techniques for improving performance of positive-tone silylation
1993 · Edward K. Pavelchek, Gary S. Calabrese, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes
2001 · Doris Kang, Stewart A. Robertson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Planarizing AR for DUV lithography
1999 · Timothy G. Adams, Suzanne Coley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Toward the development of a stable chemically amplified DUV positive photoresist
1992 · James W. Thackeray, Diane L. Canistro, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Metallized photoresists: A new approach to surface imaging
1991 · L.N. Abali, S.M. Bobbio, et al. · Microelectronic Engineering · 6
Tunable AR for DUV lithography
1997 · Edward K. Pavelchek, Manuel doCanto · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Process enhancements for positive tone silylation
1993 · G.S. Calabrese, J.F. Bohland, et al. · Microelectronic Engineering · 5
Silylated Acid Hardened Resist [SAHR] Technology: Positive, Dry Developable Deep UV Resists
1990 · James W. Thackeray, John F. Bohland, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
A Practical Approach To Lift-Off
1987 · Susan K. Jones, Richard C. Chapman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Planarizing ARs for dual-damascene processing
2001 · Edward K. Pavelchek, Marjorie Cernigliaro, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Factors affecting pitch bias in lithography simulation
2000 · Stewart A. Robertson, Edward K. Pavelchek, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Highly absorbing ARC for DUV lithography
1996 · Edward K. Pavelchek, James D. Meador, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Process techniques for improving performance of positive tone silylation
1993 · Edward K. Pavelchek, Gary S. Calabrese, et al. · Optical Engineering · 4
A novel bilevel resist system
1983 · A. W. McCullough, E. Pavelchek, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 4
Simulation of 193-nm photoresists based on different polymer platforms
2001 · Doris Kang, Stewart A. Robertson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Works count: 38
Citation count: 342
H-index: 9
I10-index: 9
Year
Topic
Type