Get started
Author

Takuro Masuzumi

Observed names: T. Masuzumi, Takuroh Masuzumi
Observed institution: The University of Osaka
OpenAlex ID: A5110050120
Influence of oxygen plasma treatment on boron carbon nitride film composition
2008 · Hidemitsu Aoki, Takuro Masuzumi, et al. · Applied Surface Science · 14
Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas
2009 · Hidemitsu Aoki, Takuro Masuzumi, et al. · Thin Solid Films · 12
Influence of the methyl group on the dielectric constant of boron carbon nitride films containing it
2010 · Hidemitsu Aoki, Takuro Masuzumi, et al. · Diamond and Related Materials · 9
Synthesis of methyl boron nitride film as low-k insulating film for LSI interconnection
2009 · Hidemitsu Aoki, Shinji Tokuyama, et al. · Diamond and Related Materials · 9
Dry etching properties of methyl-BCN film with C4F8 gas for Cu/low-k interconnection
2010 · Hidemitsu Aoki, Makoto Hara, et al. · Diamond and Related Materials · 6
Influence of Cu electroplating solutions on boron carbon nitride (BCN) film
2008 · Hidemitsu Aoki, Makoto Hara, et al. · Applied Surface Science · 5
Boron carbon nitride film containing hydrogen for 2nm node low-k interconnection
2009 · Hidemitsu Aoki, Takuroh Masuzumi, et al. · International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) · 3
Influence of oxygen plasma treatment on properties of Methyl-BCN film
2011 · Zhiming Lu, Makoto Hara, et al. · Diamond and Related Materials · 2
Properties of boron carbon nitride (BCN) film after plasma ashing
2008 · M.K. Mazumder, H. Aoki, et al. · Diamond and Related Materials · 2
Suppression of Fluorine Diffusion into Methyl Boron Carbon Nitride Film Using Low-Temperature Etching
2010 · Makoto Hara, Takuro Masuzumi, et al. · Japanese Journal of Applied Physics · 1
PDF
Properties of LaAlO Film after Waterless Process Using Organic Solvent Containing Anhydrous Hydrofluoric Acid
2010 · Masatomo Honjo, Naoyoshi Komatsu, et al. · Japanese Journal of Applied Physics
Suppression of Fluorine Diffusion into Low-k Material (Methyl-BCN) using Low Temperature Etching
2009 · M. Hara, T. Masuzumi, et al. · International Conference on Solid State Devices and Materials (SSDM)
Properties of LaAlO Film after Waterless Process using Organic Solvent containing Anhydrous HF
2009 · M. Honjo, N. Komatsu, et al. · International Conference on Solid State Devices and Materials (SSDM)
Properties of very thin adenine layer with high inhibition for 32nm node Cu/Low-K interconnection
2009 · M. Hara, H. Aoki, et al. · International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)
Works count: 14
Citation count: 63
H-index: 5
I10-index: 2
Year
Topic
Type