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Masayoshi IMAI

Observed name: Masayoshi Imai
Institution: Ebara (Japan)
OpenAlex ID: A5110124105
Effect of Dissolved Oxygen on Cu Corrosion in Single Wafer Cleaning Process
2009 · Masayoshi Imai, Yukinari Yamashita, et al. · Japanese Journal of Applied Physics · 11
Measurement of Liquid Film Thickness Distribution Formed on a Two-fluid Jet Sprayed Surface Using a Fiber Optic Probe
2023 · Shinsuke Watanabe, Yuki Mizushima, et al. · Journal of Photopolymer Science and Technology · 2
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Agitation inside the Liquid Film on Two-Fluid Jet Sprayed Surface
2024 · Naoto Doi, Shinsuke Watanabe, et al. · Journal of Photopolymer Science and Technology · 1
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Liquid Film Structure Formed by Two-Fluid Jet Impingement on a Rotating Disk
2025 · Jukiya Ikegaya, Naoto Doi, et al. · Journal of Photopolymer Science and Technology
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Flow structure and agitation effect of liquid film flow formed by the two-fluid jet: prediction of etching rate distribution in wet processing
2025 · Shinsuke Watanabe, Naoto Doi, et al. · Japanese Journal of Applied Physics
Study on particle removal by roll brush cleaning of semiconductor wafer
2023 · Yuki YOKOTA, Ayako YANO, et al. · The Proceedings of Conference of Kanto Branch
Gas-liquid phase-detection and liquid film thickness measurement on a sprayed surface with a two-fluid jet using a fiber-optic probe and laser displacement sensor
2022 · Kensho YAMAKAWA, Yuki MIZUSHIMA, et al. · Ryuutai Kougaku Bumon Kouenkai kouen rombunshuu/Ryutai Kogaku Bumon Koenkai koen ronbunshu
Research on the Droplets Collision Behavior to Liquid Film Flow for Simulating of Wafer Cleaning
2022 · Hiroki FUJISHIMA, Ayako YANO, et al. · The Proceedings of Conference of Kanto Branch
Behavior of particulate suspended droplet colliding to the liquid film flow on a rotating disk
2021 · Ayako YANO, Kohei SATO, et al. · The Proceedings of Conference of Kanto Branch
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Study on droplet removal adhered on edge of the wafer
2020 · Tsubasa ARAI, Kenji AMAGAI, et al. · The Proceedings of Conference of Kanto Branch
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Observation of particles behavior near the wall using a narrow channel
2019 · Jun MOCHIDA, Ayako YANO, et al. · The Proceedings of Conference of Kanto Branch
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微細気泡を含む噴流によるウェーハ洗浄に関する研究
2019 · Naoto KAWATA, Ayako YANO, et al. · The Proceedings of Conference of Kanto Branch
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Particle removal characteristics in liquid flow during wafer rotation
2018 · Naoyuki Handa, Satomi Hamada, et al. · IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
Study of droplet evaporation on a rotating wafer
2018 · Ryoto SEKI, Kenji AMAGAI, et al. · The Proceedings of Conference of Kanto Branch
Characteristics of liquid replacing on a rotating wafer at rinsing-process
2018 · Ryota KOSHINO, Kenji AMAGAI, et al. · The Proceedings of Conference of Kanto Branch
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Fundamental study of air flow effects on liquid removal from wafer surface
2014 · Naoyuki Handa, Kenji Amagai, et al. · International Conference on Planarization/CMP Technology (ICPT)
New Dry Tool after Cleaning of Low-k Dielectrics
2003 · Seiichiro Okuda, Hiroaki Sugimoto, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Works count: 17
Citation count: 14
H-index: 2
I10-index: 1
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