Work

Study on particle removal by roll brush cleaning of semiconductor wafer

Year: 2023

Type: conference-abstract

Source: The Proceedings of Conference of Kanto Branch

DOI: 10.1299/jsmekanto.2023.29.17d11

Authors: Yuki YOKOTA, Ayako YANO, Kenji AMAGAI, Hirokuni HIYAMA, Yutaka WADA, Akira FUKUNAGA, Masayoshi IMAI, Satomi HAMADA, Naoyuki HANDA, Tomoya NISHI

Institutions: Gunma University, Ebara (Japan)

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4387918623

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