Product
Help
Pricing
About
Jobs
Log in
Get started
Author
Add to collection
Naoyuki HANDA
Observed names:
N. Handa,
Naoyuki Handa,
ハンダ, ナオユキ
Institution:
Ebara (Japan)
Observed institutions:
Gunma University,
Ebara (Japan)
ORCID:
0000-0001-8302-0581
Observed ORCID:
0000-0001-8302-0581
OpenAlex ID:
A5037166808
Experimental and Modelling Investigation of Re-Adhesion Mechanism of Detached Nanoparticles to Wafer Surface in Spin Rinse Process
2020
·
N. Handa
, H. Hiyama
, et al.
·
ECS Journal of Solid State Science and Technology
·
11
PDF
Experimental and Modeling Investigation of the Mechanism for Preventing Readhesion via Zeta Potential in the Spin-Rinse Process
2021
·
N. Handa
, H. Hiyama
, et al.
·
ECS Journal of Solid State Science and Technology
·
1
PDF
The Influence of Dressing Conditions on Polishing Performance and Pad Surface State in CMP
2026
·
Shuntaro HAYASHI
, Naoyuki HANDA
, et al.
·
The Proceedings of Conference of Kanto Branch
Study on particle removal by roll brush cleaning of semiconductor wafer
2023
·
Yuki YOKOTA
, Ayako YANO
, et al.
·
The Proceedings of Conference of Kanto Branch
Research on the Droplets Collision Behavior to Liquid Film Flow for Simulating of Wafer Cleaning
2022
·
Hiroki FUJISHIMA
, Ayako YANO
, et al.
·
The Proceedings of Conference of Kanto Branch
Clarification of Polishing Mechanism Focusing on Abrasive Particle Behavior in CMP
2022
·
Syuntaro HAYASHI
, Syuhei KUROKAWA
, et al.
·
The Proceedings of Conference of Kyushu Branch
Behavior of particulate suspended droplet colliding to the liquid film flow on a rotating disk
2021
·
Ayako YANO
, Kohei SATO
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Study on droplet removal adhered on edge of the wafer
2020
·
Tsubasa ARAI
, Kenji AMAGAI
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Droplet Evaporation and Watermark Formation on Si Wafers with Various Films
2020
·
Ayako YANO
, Kenji AMAGAI
, et al.
·
Journal of the Japan Society for Precision Engineering
PDF
Observation of particles behavior near the wall using a narrow channel
2019
·
Jun MOCHIDA
, Ayako YANO
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Effect of the abrasive hardness and the slurry pH on the micro slurry-jet erosion of SiO2 film
2019
·
Masashi TADA
, Takeshi NISHIOKA
, et al.
·
The Proceedings of Conference of Hokuriku-Shinetsu Branch
微細気泡を含む噴流によるウェーハ洗浄に関する研究
2019
·
Naoto KAWATA
, Ayako YANO
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Particle removal characteristics in liquid flow during wafer rotation
2018
·
Naoyuki Handa
, Satomi Hamada
, et al.
·
IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
Study of droplet evaporation on a rotating wafer
2018
·
Ryoto SEKI
, Kenji AMAGAI
, et al.
·
The Proceedings of Conference of Kanto Branch
Characteristics of liquid replacing on a rotating wafer at rinsing-process
2018
·
Ryota KOSHINO
, Kenji AMAGAI
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Fundamental study of air flow effects on liquid removal from wafer surface
2014
·
Naoyuki Handa
, Kenji Amagai
, et al.
·
International Conference on Planarization/CMP Technology (ICPT)
21203 Study on evaporation enhancement of water film on wafer by EPA
2014
·
Naoyuki HANDA
, Kenji AMAGAI
, et al.
·
The Proceedings of Conference of Kanto Branch
PDF
Show more works
View as search
Works count:
18
Citation count:
12
H-index:
1
I10-index:
1
Year
Topic
Type
