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Chun Chi Yu

Observed names: Chun Yu, Yuan Chi Pai
OpenAlex ID: A5110605293
4-Trifluoromethanesulfonamidyl prolinol tert-butyldiphenylsilyl ether as a highly efficient bifunctional organocatalyst for Michael addition of ketones and aldehydes to nitroolefins
2009 · Chao Wang, Chun Yu, et al. · Tetrahedron Letters · 44
Nickel-Catalyzed Cross Coupling of Cyclopropyl Grignard Reagents with Benzylic Dithioacetals. Regioselective Ring Opening of Cyclopropylcarbinyl Organometallic Intermediates. Novel Synthesis of Substituted Dienes
1994 · Chun Chi Yu, Dennis K. P. Ng, et al. · Organometallics · 22
Facile .beta.-OR and .beta.-SR elimination in the nickel-catalyzed cross-coupling reactions of dithioacetals and related compounds with Grignard reagents
1993 · Lung Lin Shiu, Chun Chi Yu, et al. · Organometallics · 18
Scatterometry or imaging overlay: a comparative study
2015 · Simon C. C. Hsu, Yuan Chi Pai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Device-correlated metrology for overlay measurements
2014 · Charlie Chen, DongSub Choi, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 9
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Non-topcoat resist design for immersion process at 32-nm node
2008 · Steven Wu, Aroma Tseng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
DCM: device correlated metrology for overlay measurements
2013 · Charlie Chen, George K. C. Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Multi-level overlay techniques for improving DPL overlay control
2012 · Charlie Chen, Y. C. Pai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Scatterometry measurement for gate ADI and AEI critical dimension of 28-nm metal gate technology
2011 · Yu-Hao Huang, Howard Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Innovative fast technique for overlay accuracy estimation using archer self calibration (ASC)
2014 · Simon C. C. Hsu, Charlie Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
DFM: a practical layout optimization procedure for the improved process window for an existing 90-nm product
2006 · Jonathan Ho, Yan Wang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
UDOF direct improvement by modulating mask absorber thickness
2016 · Tuan-Yen Yu, En Chuan Lio, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Full-chip lithography manufacturability check for yield improvement
2006 · Yongfa Huang, Edward Tseng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Metrology of advanced N14 process pattern split at lithography
2014 · Wei-Jhe Tzai, Chia-Ching Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Improvement of the common DoF across field for hole-structure process layers
2008 · Shu Huei Hou, Edgar Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Top-coatless 193nm positive-tone development immersion resist for logic application
2015 · Lian Cong Liu, Tsung Ju Yeh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Quantitative Analysis of Mental Effort Investment using Photoplethysmogram
2014 · Yongqiang Lyu, Tianshu Yang, et al. · International Conference on Health Informatics · 1
High scan speed EBL containing contact hole resists with low defectivity
2013 · Tsung Ju Yeh, Lian Cong Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Development of Si-HM for NTD process
2012 · Wen Liang Huang, Yu Chin Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Line width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
2008 · Bo Jou Lu, E. T. Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Depth-of-focus (DOF) and line-width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography
2007 · Bo Jou Lu, Yongfa Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Intra-field alignment for overlay feed-forward simulation with sampling optimization
2019 · Cheng Hao Yang, Chun Chi Yu, et al. · Metrology, Inspection, and Process Control XXXVI
Triple AIM evaluation and application in advanced node
2016 · Gary C. Wang, En Chuan Lio, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
In die mask overlay control for 14nm double-patterning lithography
2015 · William Chou, James Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Immersion BARC for hyper NA applications II
2010 · Yu-Chin Huang, Kai-Lin Chuang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 27
Citation count: 170
H-index: 7
I10-index: 4
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