Work

Full-chip lithography manufacturability check for yield improvement

Year: 2006

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.656401

Authors: Yongfa Huang, Edward Tseng, Benjamin Szu-Min Lin, Chun Chi Yu, Chien-Ming Wang, Hua-Yu Liu

Institution: United Microelectronics (Taiwan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2079868397

FWCI:

Cites:

Cited by: 4

Related to: 10