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Benjamin Szu-Min Lin

Observed names: Benjamin Lin, Benjamin S. Lin, Benjamin S. M. Lin
OpenAlex ID: A5111780822
Inverse lithography technology at chip scale
2006 · Benjamin Lin, Ming Feng Shieh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21
Challenges of 29nm half-pitch NAND Flash STI patterning with 193nm dry lithography and self-aligned double patterning
2008 · M. C. Chiu, Benjamin Szu-Min Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Real-world impact of inverse lithography technology
2005 · Jonathan Ho, Yan Wang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Calibration of OPC models for multiple focus conditions
2004 · Jochen Schacht, Klaus Herold, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Improve overlay control and scanner utilization through high order corrections
2008 · Hung Ming Lin, Benjamin Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
DFM: a practical layout optimization procedure for the improved process window for an existing 90-nm product
2006 · Jonathan Ho, Yan Wang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Process requirements for pitch splitting LELE double patterning at advanced logic technology node
2012 · R. C. Peng, I. H. Huang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Laser spectrum requirements for tight CD control at advanced logic technology nodes
2010 · R. C. Peng, H. J. Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Full-chip lithography manufacturability check for yield improvement
2006 · Yongfa Huang, Edward Tseng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Extension of ArF lithography for poly gate patterning of 65-nm generation and beyond
2004 · Shu-Hao Hsu, Shu-Ping Fang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Numerical analysis of a step-coupled well: A novel quantum-confined Stark shift structure
1992 · Benjamin S. M. Lin, S. J. Lin, et al. · Journal of Applied Physics · 4
65-nm photolithography process window qualification study with advanced e-beam metrology and inspection systems
2006 · Ruei Hung Hsu, Benjamin Szu-Min Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Two-dimensional quantum model on photoyield of the p+-SiGe/p-Si heterojunction internal photoemission infrared detector
1994 · Benjamin S. M. Lin, J. Hwang · Journal of Applied Physics · 3
EUV Source System Development for 22nm Generation and Beyond
2009 · Benjamin Lin, David Brandt, et al. · ECS Transactions · 2
The rapid introduction of immersion lithography for NAND flash: challenges and experience
2008 · Chan-Tsun Wu, Hung Ming Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
A simple and practical approach for building lithography simulation models using a limited set of CD data and SEM pictures
2007 · Yan Wang, Jonathan Ho, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection
2004 · Stephen Hsu, Tsann-bin Chu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Practical approach for AAPSM image imbalance correction for sub-100-nm lithography
2003 · Hung Lin Cho, Shu Yi Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Two-dimensional quantum size effect on the internal photoemission
1992 · Benjamin S. M. Lin, J. Hwang · Applied Physics Letters · 2
Cymer LPP EUV Source System Development Status
2011 · Benjamin Lin, Bruno La Fontaine, et al. · ECS Transactions · 1
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The performances of different overlay mark types at 65nm node on 300-mm wafers
2005 · H. T. Tseng, Ling-Chieh Lin, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
DFM in practice: results of a three way partnership between a leading fabless design house, foundry, and EDA company to implement alternating-phase shift mask (Alt-PSM) on a 90-nm FPGA chip
2005 · Chun-Chi Yu, Ming-Feng Shieh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Capability of spectroscopic ellipsometry-based profile metrology for detecting the profile excursion of polysilicon gate
2004 · Mike Yeh, Shu-Ping Fang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Implementing AAPSM in 90-nm product with practical image imbalance correction
2003 · Benjamin S. Lin, Shu-hao Hsu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
HVM LPP EUV Source System Development Status
2010 · Benjamin Lin, David Brandt, et al. · ECS Transactions
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Works count: 39
Citation count: 115
H-index: 5
I10-index: 4
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