Inverse lithography technology at chip scale
Year: 2006
Type: conference-paper
DOI: 10.1117/12.656827
Authors: Benjamin Lin, Ming Feng Shieh, Jie-wei Sun, Jonathan Ho, Yan Wang, Xin Wu, Wolfgang Leitermann, Orson Lin, Jason Lin, Yong Liu, Linyong Pang
Institutions: United Microelectronics (Taiwan), Xilinx (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2017521492