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Process requirements for pitch splitting LELE double patterning at advanced logic technology node

Year: 2012

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.916420

Authors: R. C. Peng, I. H. Huang, H. H. Liu, H. J. Lee, John Lin, Arthur Lin, Allen Chang, Benjamin Szu-Min Lin, Ivan Lalovic

Institutions: Taiwan Semiconductor Manufacturing Company (Taiwan), KLA (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2085648924

FWCI: 1.219

Cites: 13

Cited by: 4

Related to: 10