Work

DFM in practice: results of a three way partnership between a leading fabless design house, foundry, and EDA company to implement alternating-phase shift mask (Alt-PSM) on a 90-nm FPGA chip

Year: 2005

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.598838

Authors: Chun-Chi Yu, Ming-Feng Shieh, Erick Liu, Benjamin Lin, Henry Lin, Manoj Chacko, Xiaoyang Li, Wen-Kang Lei, Jonathan Ho, Xin Wu

Institutions: United Microelectronics (Taiwan), Synopsys (United States), Xilinx (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2010043636

FWCI: 0.563

Cites:

Cited by: 1

Related to: 10