Author

Setsuo Nakajima

Observed names: Nakajima Setsuo, Setsuo NAKAJIMA, 節男中嶋

Institution: Sekisui Chemical (Japan)

Observed institution: Sekisui Chemical (Japan)

OpenAlex ID: A5111366793

In Situ Observation of Structural Change in N719 Dye Molecule in Dye Sensitized Solar Cells with a Light Exposure and a Heat Treatment

2012 · Chie Yoshida, Setsuo Nakajima, et al. · Journal of The Electrochemical Society · 13

Incubation-Free Growth of Polycrystalline Si Films by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Discharge under Near Atmospheric Pressure

2005 · Hirotatsu Kitabatake, Maki Suemitsu, et al. · Japanese Journal of Applied Physics · 9

Deposition of Highly Crystallized Poly-Si Thin Films on Polymer Substrates Using Pulsed-Plasma CVD under Near-Atmospheric Pressure

2006 · Mitsutaka Matsumoto, Maki Suemitsu, et al. · ECS Transactions · 4

Low Temperature Deposition of Si-based Thin Films on Plastic Films Using Pulsed-Discharge PECVD under Near Atmospheric Pressure

2008 · Mitsutaka Matsumoto, Yohei Inayoshi, et al. · MRS Proceedings · 1

Discharge Instability at Patterned Conductive Layers on Insulating Substrates during Pulsed-Plasma Chemical Vapor Deposition under Near Atmospheric Pressures

2013 · Yohei Inayoshi, Hirokazu Fukidome, et al. · e-Journal of Surface Science and Nanotechnology

In Situ Observation of Structural Change in N719 Dye Molecule in Dye Sensitized Solar Cells under a Visible Light Exposure

2012 · Chie Yoshida, Setsuo Nakajima, et al. · ECS Meeting Abstracts

In-situ observation of dye/TiO2 interface in N719 dye sensitized solar cells

2012 · Shoji Yuki, Eiki Ito, et al. · IEICE Technical Report; IEICE Tech. Rep.

N719色素増感太陽電池における色素/酸化チタン界面のその場観察(tft(有機,酸化物),一般)

2012 · 優樹庄子, 瑛基伊藤, et al. · 電子情報通信学会技術研究報告. ED, 電子デバイス

Cleaning-Free Deposition of Highly Crystallized Si Films on Plastic Film Substrates Using Pulsed-Plasma CVD under Near-Atmospheric Pressure

2009 · Mitsutaka Matsumoto, Syun Ito, et al. · ECS Transactions

Cleaning-Free Deposition System Using Pulsed-Plasma CVD under Near-Atmospheric Pressure for Highly Crystallized Poly-Si Thin Films on Plastic Films

2009 · Mitsutaka Matsumoto, Yohei Inayoshi, et al. · ECS Meeting Abstracts

Growth of polycrystalline Si on plastic substrate using pulsed-plasma CVD under near atmospheric Pressure

2009 · Shogo Murashige, Mitsutaka Matsumoto, et al. · 電子情報通信学会技術研究報告. ED, 電子デバイス

Low Temperature Growth of Polycrystalline Si Films Using Pulsed-Plasma CVD under Near Atmospheric Pressure

2008 · Mitsutaka MATSUMOTO, Yasutake TOYOSHIMA, et al. · Journal of the Vacuum Society of Japan

Deposition of Highly Crystallized Poly-Si Thin Films on Polymer Substrates Using Pulsed-Plasma CVD under Near-Atmospheric Pressure

2006 · Mitsutaka matsumoto, Maki Suemitsu, et al. · ECS Meeting Abstracts

Silicon Thin Film Growth by Pulsed Plasma CVD under Near-Atmospheric Pressure

2005 · Hirotatsu Kitabatake, Maki Suemitsu, et al. · MRS Proceedings

Low-Temperature Poly-Si TFT-LCDs with Digital Interface

1997 · Jun Koyama, Yasushi Ogata, et al. · International Conference on Solid State Devices and Materials (SSDM)

Works count: 15

Citation count: 27

H-index: 3

I10-index: 1