Author

James N. Wiley

Observed institution: KLA (United States)

OpenAlex ID: A5111656167

Issues associated with the commercialization of phase-shift masks

1992 · John L. Nistler, Greg P. Hughes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14

High-resolution ultraviolet defect inspection of DAP (darkfield alternate phase) reticles

1999 · Lars W. Liebmann, Scott M. Mansfield, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Phase-shift mask pattern accuracy requirements and inspection technology

1991 · James N. Wiley, Tao-Yi Fu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Effect of Stepper Resolution on the Printability of Submicron 5x Reticle Defects

1989 · James N. Wiley · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Results from a new reticle defect inspection platform

2003 · William H. Broadbent, James N. Wiley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Multibeam high-resolution UV wavelength reticle inspection

2001 · Chih-Chien Hung, Chue-San Yoo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Accelerated yield learning in agressive lithography

2000 · Kevin M. Monahan, Scott M. Ashkenaz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Defect printability analysis by lithographic simulation from high resolution mask images

2009 · George Chen, James N. Wiley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Results from a new die-to-database reticle inspection platform

2004 · William H. Broadbent, James N. Wiley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Multibeam high-resolution UV wavelength reticle inspection

2001 · Chih-Chien Hung, Chue-San Yoo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Reticle inspection system using DUV wavelength and new alogorithm platform for advanced reticle inspection for 0.13-μm technology node

2000 · David S. Alles, Paul Terbeek, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Effects of transparent and transmission reduction reticle defects

1994 · Larry S. Zurbrick, Steven J. Schuda, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Comprehensive detection of defects on reduction reticles

1994 · James N. Wiley · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

The printability of 5x reticle submicron defects

2023 · James N. Wiley · Bay Area Chrome Users Society Symposium (BACUS) · 1

High-resolution UV wavelength reticle contamination inspection

1999 · Franklin D. Kalk, William W. Volk, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Defect inspection and linewidth measurement of SCALPEL thin membrane masks using optical transmission

1998 · Reginald C. Farrow, Myrtle I. Blakey, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Characterization of an advanced performance reticle defect inspection algorithm

1997 · James N. Wiley, Christopher M. Aquino, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Effect of off-axis illumination on the printability of opaque and transparent reticle defects

1995 · James N. Wiley, Linard Karklin · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Mask-LMC: lithographic simulation and defect detection from high-resolution mask images

2009 · George Chen, James N. Wiley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Exploring new high speed mask aware RET verification flows

2005 · Patrick Martin, Christopher J. Progler, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

High-resolution UV wavelength reticle contamination inspection

1999 · Franklin D. Kalk, William W. Volk, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Inspecting the new generation of reticles using UV imaging

1999 · Mark A. Merrill, James N. Wiley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Printability of backside reticle defects

1998 · William W. Volk, James N. Wiley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

High-resolution UV wavelength reticle inspection

1998 · Mark A. Merrill, Hector I. Garcia, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Review of defect round table at Photomask Japan '96

1996 · Hiroichi Kawahira, James N. Wiley · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 26

Citation count: 73

H-index: 5

I10-index: 2