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Keun-Kyu Kong
Observed name:
Keun-kyu Kong
Institution:
SK Hynix (South Korea)
Observed institution:
SK Hynix (South Korea)
OpenAlex ID:
A5111779800
Contact hole patterning performance of ArF resist for 0.10 μm technology node
2002
·
Jin-Soo Kim
, Jae Chang Jung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
100 nm device fabrication using ArF resist
2002
·
Sung-Koo Lee
, Jae Chang Jung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
2002
·
Young-Sun Hwang
, Jae Chang Jung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
New ArF Photoresist Based on Modified Maleic Anhydride Cycloolefin Polymers.
2002
·
Hyun-pyo Jeon
, Dong-chul Seo
, et al.
·
Journal of Photopolymer Science and Technology
·
1
PDF
Novel chemically amplified positive resist containing acetal-type crosslinker of poly(3,3'-dimethoxypropene) for 193-nm top surface imaging process
2001
·
Cha-Won Koh
, Jae Chang Jung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Implementation of COMA type ArF Resist for Sub-100nm Patterning.
2001
·
Jae-Chang Jung
, Sung-Ku Lee
, et al.
·
Journal of Photopolymer Science and Technology
·
1
PDF
Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era
2005
·
Young-Sik Kim
, Yoon-Suk Hyun
, et al.
·
Optical Microlithography XVIII
Printing 95-nm DRAM full chip patterns in KrF lithography
2003
·
Seok-Kyun Kim
, Jin-Soo Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era
2003
·
Tae-Jun You
, Hyeong-Soo Kim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Effects of alkali treatment on ArF resist process
2003
·
Jin-Soo Kim
, Jae-Chang Jung
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography
2003
·
Young-Sik Kim
, Tae Jun You
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)
2002
·
Geunsu Lee
, Keun-Kyu Kong
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
New approach for 193-nm resist using modified cycloolefin resin
2002
·
Joo Hyeon Park
, Dong-Chul Seo
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Amine gradient process for 157-nm lithography
2002
·
Jae Chang Jung
, Keun-Kyu Kong
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Novel high-performance ArF resist for sub-100-nm lithography
2001
·
Geunsu Lee
, Cha-Won Koh
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Extraction of Semiconductor Dopant Profile from Spreading Resistance Data: An Inverse Problem
1989
·
S.C. Choo
, M.S. Leong
, et al.
·
PIERS: Progress in Electromagnetics Research Symposium
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Works count:
16
Citation count:
8
H-index:
1
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