Author

Alfonso Gómez

Observed names: A Gómez, A. Gomez, A. Gómez, A. Gómez

Observed institutions: Universidad de Valladolid, Universidad Complutense de Madrid

OpenAlex ID: A5111807642

Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2O3, HfO2, and nanolaminates on different silicon substrates

2011 · F. Campabadal, J. M. Rafí, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 52

Electrical Properties of Atomic-Layer-Deposited Thin Gadolinium Oxide High-k Gate Dielectrics

2007 · S. Dueñas, H. Castán, et al. · Journal of The Electrochemical Society · 39

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Influence of interlayer trapping and detrapping mechanisms on the electrical characterization of hafnium oxide/silicon nitride stacks on silicon

2008 · H. García, S. Dueñas, et al. · Journal of Applied Physics · 28

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2 MeV electron irradiation effects on the electrical characteristics of metal–oxide–silicon capacitors with atomic layer deposited Al2O3, HfO2 and nanolaminated dielectrics

2012 · J.M. Rafí, F. Campabadal, et al. · Solid-State Electronics · 26

Effect of interlayer trapping and detrapping on the determination of interface state densities on high-k dielectric stacks

2010 · H. Castán, S. Dueñas, et al. · Journal of Applied Physics · 23

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Irradiation effect on dielectric properties of hafnium and gadolinium oxide gate dielectrics

2009 · H. García, S. Dueñas, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 18

Electrical properties of thin zirconium and hafnium oxide high-k gate dielectrics grown by atomic layer deposition from cyclopentadienyl and ozone precursors

2009 · S. Dueñas, H. Castán, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 18

Electrical properties of high-pressure reactive sputtered thin hafnium oxide high-kgate dielectrics

2007 · S Dueñas, H Castán, et al. · Semiconductor Science and Technology · 17

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Electrical characterization of high-k based metal-insulator-semiconductor structures with negative resistance effect when using Al2O3 and nanolaminated films deposited on p-Si

2011 · A. Gómez, H. Castán, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 16

Comparison between the electrical properties of atomic layer deposited thin ZrO2 films processed from cyclopentadienyl precursors

2009 · Salvador Dueñas, Helena Castán, et al. · Microelectronic Engineering · 10

Comparative Study of Flatband Voltage Transients on High-k Dielectric-Based Metal–Insulator–Semiconductor Capacitors

2008 · S. Dueñas, H. Castán, et al. · Journal of The Electrochemical Society · 10

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Influence of precursor chemistry and growth temperature on the electrical properties of SrTiO3-based metal-insulator-metal capacitors grown by atomic layer deposition

2011 · H. García, H. Castán, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 8

Interface quality of Sc2O3 and Gd2O3 films based metal–insulator–silicon structures using Al, Pt, and Ti gates: Effect of buffer layers and scavenging electrodes

2012 · Alfonso Gómez, Helena Castán, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 6

Smartphones on the air track. Examples and difficulties

2018 · Manuel Ángel González Delgado, Alfonso Gómez, et al. · Papers in Physics · 3

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Electrical characterization of high-pressure reactive sputtered ScOx films on silicon

2010 · H. Castán, S. Dueñas, et al. · Thin Solid Films · 3

Electrical Characterization of High-Pressure Reactive Sputtered Sc2O3 Films on Silicon

2010 · Helena Castán, Salvador Dueñas, et al. · ECS Transactions · 1

Electrical characterization of high-k based MIS capacitors using flat-band voltage transients

2009 · H. Garcia, S. Duenas, et al. · Spanish Conference on Electron Devices · 1

Characterization of SrTiO3-based MIM capacitors grown by using different precursors and growth temperatures

2011 · H. Garcia, H. Castan, et al. · Spanish Conference on Electron Devices

A study of tunneling assisted charge exchange on the inner interface of high-k dielectric stacks