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Jeong Y. Choi
Observed names:
J. Y. Choi,
J.-Y. Choi,
J.Y. Choi,
Jeong Choi,
Jeong Ryeol Choi,
Jeongseok Choi
show all 6
Institution:
Kyonggi University
Observed institutions:
Kyonggi University,
Integrated Device Technology (United States),
Pusan National University,
University of California, Berkeley
OpenAlex ID:
A5112787440
Simulation of MOSFET lifetime under AC hot-electron stress
1988
·
M.M. Kuo
, K. Seki
, et al.
·
IEEE Transactions on Electron Devices
·
88
Hot-carrier-induced MOSFET degradation under AC stress
1987
·
J.Y. Choi
, P.K. Ko
, et al.
·
IEEE Electron Device Letters
·
66
Effect of oxide field on hot-carrier-induced degradation of metal-oxide-semiconductor field-effect transistors
1987
·
J. Y. Choi
, P. K. Ko
, et al.
·
Applied Physics Letters
·
31
Modeling the turn-off characteristics of the bipolar-MOS transistor
1985
·
D.-S. Kuo
, J.-Y. Choi
, et al.
·
IEEE Electron Device Letters
·
31
Characterization of very thin gate-oxide MOS devices
1984
·
M.-S. Liang
, J.Y. Choi
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
21
Hot-Carrier-Induced MOSFET Degradation: AC Versus DC Stressing
1987
·
Jeong Y. Choi
, P.K. Ko
, et al.
·
Rare & Special e-Zone (The Hong Kong University of Science and Technology)
·
20
Quasi-static simulation of hot-electron-induced MOSFET degradation under AC (pulse) stress
1987
·
M.M. Kuo
, K. Seki
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
17
Computational modeling of high pressure combustion mechanism in scram accelerator
2000
·
J.-Y. Choi
, B.-J. Lee
, et al.
·
Journal de Physique IV (Proceedings)
·
5
An electrical technique for determining MOSFET gate length reduction due to process micro-loading effects in advanced CMOS technology
2002
·
Chunbo Liu
, J. Ma
, et al.
·
IEEE International Conference on Microelectronic Test Structures (ICMTS)
·
2
An early detection method of device burn-in failure caused by tungsten side-diffusion through seam in premetal dielectric film
2002
·
Sang-Yun Lee
, Jeong Choi
, et al.
·
IEEE Electron Device Letters
·
2
Performance Evaluation of Sic Mosfet-Based Inverter for Individual Blade Control in Electrical Aircraft
2025
·
Simon Kim
, Yonggyun Park
, et al.
·
IEEE Transportation Electrification Conference and Expo
·
1
Numerical modeling and simulation of RAMAC 30 experiment carried out at the French-German research institute of Saint-Louis
2000
·
G.-W. Moon
, I.-S. Jeung
, et al.
·
Journal de Physique IV (Proceedings)
·
1
Quantum dots for advanced photonics: synthesis, technological applications, challenges, and future directions
2026
·
Nadia Anwar
, Muqarrab Ahmed
, et al.
·
Journal of Industrial and Engineering Chemistry
Quantum Analysis of the Effects of Coordinate Noncommutativity on Bidimensional Harmonic Motion under Parametric Variations
2026
·
Salim Medjber
, Hacene Bekkar
, et al.
·
International Journal of Theoretical Physics
PDF
Capturing Unstable Wrinkled Oblique Detonation Wave Front by Hi-Fi Numerical Simulation
2006
·
J.-Y. Choi
, Dongwan Kim
, et al.
·
AIAA/ASME/SAE/ASEE Joint Propulsion Conference & Exhibit (JPC)
Properties of ultrathin gate oxides grown in N 2 O-based oxidation ambients by rapid thermal processing
1999
·
Y. B. Jia
, Ohm G. Pan
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
0.18-μm gate length CMOS devices with N+polycide gate for 2.5-V application
1997
·
Jeong Y. Choi
, Eric Zhang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Lg=0.25-um CMOS devices with N+-polycide gate for 3.3-V application
1996
·
Jeong Y. Choi
, Zhijian Ma
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Scaling considerations of interpoly oxide-nitride-oxide dielectric for high-density DRAM applications
1996
·
Zhijian Ma
, Jeong Y. Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Integrity of N 2 O oxides in WSi 2 polycide process
1995
·
Chung Jen Chien
, Jeong Y. Choi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
CMOS LDD process with seven masking steps from well to passivation
1995
·
Jeong Y. Choi
, Chung Jen Chien
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
21
Citation count:
285
H-index:
7
I10-index:
7
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