Author

Don Dussault

Observed names: D. Dussault, Donald Dussault

OpenAlex ID: A5112852722

Innovative Megasonic Cleaning Technology Evaluated Through Direct Wafer Bonding

2010 · Frank Fournel, Laurent Bally, et al. · ECS Transactions · 6

High Efficiency Single Wafer Cleaning for Wafer Bonding-Based 3D Integration Applications

2012 · Don Dussault, F. Fournel, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 4

Coupling Supramolecular Assemblies and Reactive Oxygen Species (ROS) with Megasonic Action for Applications in Shallow Trench Isolation (STI) Post-Chemical Mechanical Planarization (p-CMP) Cleaning

2022 · Katherine M. Wortman-Otto, Don Watson, et al. · ACS Omega · 3

High Efficiency Cleaning Processes for Direct Wafer Bonding

2016 · Donald Dussault, Jan Rothballer, et al. · ECS Transactions · 3

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Control of cavitation density through gas and acoustic uniformity in a proximity megasonic pre-bond cleaning system

2013 · D. Dussault, E. Liebscher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

CMOS-compatible aligned fusion wafer bonding

2011 · V. Dragoi, G. Mittendorfer, et al. · CAS proceedings · 3

Advanced Process Control in Megasonic- Enhanced Pre-Bonding Cleaning

2013 · Donald Dussault, Frank Fournel, et al. · ECS Transactions · 2

Improving Megasonic Exposure Uniformity for EUV Mask Substrate Cleaning

2011 · Matthew House, Abbas Rastegar, et al. · ECS Transactions · 2

Megasonic Enhanced Photo Resist Removal Using Unique Solvent Free Phase-Fluids on an Advanced Single Wafer Resist Processing System

2018 · Donald Dussault, Martin Weinhart, et al. · ECS Meeting Abstracts · 1

Post CMP Cleaning: a Comparison of Contact and Non-Contact Physical Cleaning Methods

2015 · Donald Dussault, Mark Beck, et al. · ECS Meeting Abstracts · 1

Megasonic Enhanced Photoresist Strip with DiO3

2014 · Don Dussault, Jens Fittkau, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena · 1

Novel Photolithography Yield-Enhancement Technique: Megasonic-Enhanced Development

2010 · Viorel Dragoi, Johanna Bartel, et al. · ECS Transactions · 1

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Megasonic Enhanced Photo Resist Removal Using Unique Solvent Free Phase-Fluids on an Advanced Single Wafer Resist Processing System

2018 · Donald Dussault, Martin Weinhart, et al. · ECS Transactions

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Multi Factorial Study of Megasonic Enhanced Photoresist Strip with DiO3

2016 · Jens Fittkau, Donald Dussault, et al. · ECS Meeting Abstracts

High Efficiency Cleaning Processes for Direct Wafer Bonding

2016 · Donald Dussault, Jan Rothballer, et al. · ECS Meeting Abstracts

Multi Factorial Study of Megasonic Enhanced Photoresist Strip with DiO3

2016 · Jens Fittkau, Donald Dussault, et al. · ECS Transactions

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Unique Applications of Megasonic Energy to MEMS Single Substrate Wet Processes

2014 · Donald Dussault, Viorel Dragoi · ECS Transactions

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Unique Applications of Megasonic Energy to MEMS Single Substrate Wet Processes

2014 · Donald Dussault, Viorel Dragoi · ECS Meeting Abstracts

Pre-bond megasonic cleaning with improved process control

2013 · D. Dussault, E. Liebscher, et al. · Microsystem Technologies

Direct vs. Indirect Megasonic Tank Cleaning Systems; Uniformity, Cleaning Efficiency and Cost of Ownership

2012 · J. Desagher, Don Dussault, et al. · Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

Advanced Process Control in Megasonic- Enhanced Pre-Bonding Cleaning

2012 · Donald Dussault, Frank Fournel, et al. · ECS Meeting Abstracts

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Acoustic Energy: a New Tool for MEMS Manufacturing

2012 · D. Dussault, V. Dragoi · MRS Proceedings

Megasonic — Enhanced development for photolithography yield improvement

2011 · D. Dussault, V. Dragoi · CAS proceedings

Improving Megasonic Exposure Uniformity for EUV Mask Substrate Cleaning

2011 · Matthew House, Abbas Rastegar, et al. · ECS Meeting Abstracts

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Innovative Megasonic Cleaning Technology Evaluate Through Direct Wafer Bonding

2010 · Frank Fournel, Don Dussault, et al. · ECS Meeting Abstracts

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Works count: 26

Citation count: 30

H-index: 3

I10-index: