Get started
Author

Takeo Ishibashi

Advanced Micro-Lithography Process with Chemical Shrink Technology
2001 · Takeo Ishibashi, Toshiyuki Toyoshima, et al. · Japanese Journal of Applied Physics · 16
Advanced microlithography process with chemical shrink technology
2000 · Takashi Kanda, Hatsuyuki Tanaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16
Advanced Micro-Lithography Process for i-line Lithography
2001 · Takeo Ishibashi, Toshiyuki Toyoshima, et al. · Japanese Journal of Applied Physics · 10
PDF
Advanced RELACS Technology for ArF Resist
2003 · Mamoru Terai, Toshiyuki Toyoshima, et al. · Journal of Photopolymer Science and Technology · 7
PDF
Surface Segregation Analysis of Hydrophobic Additive of Non-topcoat Resist
2008 · Takuya Hagiwara, Takeo Ishibashi, et al. · Journal of Photopolymer Science and Technology · 6
PDF
Novel Spin-on Carbon Hard Mask with Hardening by Ion Implantation
2007 · Takeo Ishibashi, Yoshiharu Ono, et al. · Journal of Photopolymer Science and Technology · 5
PDF
Novel Wafer Bevel Treatment for Water Immersion Lithography
2008 · Mamoru Terai, Takeo Ishibashi, et al. · Journal of Photopolymer Science and Technology · 3
PDF
Newly Developed Resolution Enhancement Lithography Assisted by Chemical Shrink Process and Materials for Next-Generation Devices
2006 · Mamoru Terai, Teruhiko Kumada, et al. · Japanese Journal of Applied Physics · 3
PDF
Studies of the mechanism for immersion specific defects
2006 · Takeo Ishibashi, Tetsuro Hanawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Double patterning using dual spin-on Si containing layers with multilayer hard mask process
2008 · Mamoru Terai, Takeo Ishibashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Mechanism of immersion specific defects with high receding-angle topcoat
2007 · Mamoru Terai, Teruhiko Kumada, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Development of high-performance multi-layer resist process with hardening treatment
2007 · Yoshiharu Ono, Takeo Ishibashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Verification of optical proximity effect in immersion lithography
2006 · Toshifumi Suganaga, Shinroku Maejima, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Newly developed RELACS materials and processes for the 65 nm node and beyond
2006 · Mamoru Terai, Teruhiko Kumada, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Characteristics of ArF Immersion Lithography Using Topcoat
2006 · Takeo Ishibashi, Tetsuro Hanawa, et al. · Journal of Photopolymer Science and Technology · 2
Below 70-nm contact hole pattern with RELACS process on ArF resist
2003 · Mamoru Terai, Toshiyuki Toyoshima, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Below 100-nm Hole Pattern Formation Using Resolution Enhancement Lithography Assisted by Chemical Shrink (RELACS).
2002 · Toshiyuki Toyoshima, Takeo Ishibashi, et al. · Journal of Photopolymer Science and Technology · 2
PDF
Defect reduction in non-topcoat resist by selective segregation removal step
2009 · Takuya Hagiwara, Mamoru Terai, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Depth Profile Analysis of Plasma-cured Multi Layer Resist
2006 · Haruki Okumura, Takeshi Matsunobu, et al. · Journal of Photopolymer Science and Technology · 1
PDF
The first on-site evaluation of a new filter optimized for TARC and developer
2008 · Toru Umeda, Takeo Ishibashi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Studies on immersion defects using mimic immersion experiments
2006 · Tetsuro Hanawa, Toshifumi Suganaga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Development of high performance multi-layer process with H2 plasma hardening
2006 · Takeo Ishibashi, Yoshiharu Ono, et al. · Polymer Preprints, Japan
Works count: 22
Citation count: 87
H-index: 5
I10-index: 3
Year
Topic
Type