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SCREEN Semiconductor Solutions Co., Ltd. (Japan)
Homepage:
screen.co.jp
Alternate names:
SCREEN Semiconductor Solutions,
SCREEN Semiconductor Solutions Co., Ltd.,
株式会社SCREENセミコンダクターソリューションズ
ROR:
00aywkt47
OpenAlex ID:
I4405273708
Doping of semiconductor devices by Laser Thermal Annealing
2016
·
Karim Huet
, Fulvio Mazzamuto
, et al.
·
Materials Science in Semiconductor Processing
·
74
Phase field model of the nanoscale evolution during the explosive crystallization phenomenon
2018
·
S. F. Lombardo
, S. Boninelli
, et al.
·
Journal of Applied Physics
·
37
PDF
Controlled cobalt recess for advanced interconnect metallization
2019
·
Antoine Pacco
, Yuya Akanishi
, et al.
·
Microelectronic Engineering
·
32
SiGe vs. Si Selective Wet Etching for Si Gate-all-Around
2018
·
Kana Komori
, Jens Rip
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
16
Dependence of photoresist dissolution dynamics in alkaline developers on alkyl chain length of tetraalkylammonium hydroxide
2022
·
Masahiko Harumoto
, Julius Joseph Santillan
, et al.
·
Japanese Journal of Applied Physics
·
15
Pattern collapse mitigation by controlling atmosphere during development process for semiconductor lithography
2021
·
Masahiko Harumoto
, Tomohiro Motono
, et al.
·
Japanese Journal of Applied Physics
·
15
PDF
Roughness and Uniformity Control during Wet Etching of Molybdenum
2021
·
Antoine Pacco
, Yuya Akanishi
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
14
Nanoscale measurements of phosphorous-induced lattice expansion in nanosecond laser annealed germanium
2018
·
S. Boninelli
, R. Milazzo
, et al.
·
APL Materials
·
14
PDF
Low Thermal Budget Ohmic Contact Formation by Laser Anneal
2016
·
Fulvio Mazzamuto
, Sebastien Halty
, et al.
·
Materials science forum
·
14
Wet Selective SiGe Etch to Enable Ge Nanowire Formation
2016
·
Farid Sebaai
, Liesbeth Witters
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
13
Silicon Carbide Recrystallization Mechanism by Non-Equilibrium Melting Laser Anneal
2016
·
Fulvio Mazzamuto
, Sebastien Halty
, et al.
·
Materials science forum
·
13
Etching of molybdenum via a combination of low-temperature ozone oxidation and wet-chemical oxide dissolution
2023
·
Antoine Pacco
, Teppei Nakano
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
12
Fabrication of thin ferroelectric Hf0.5Zr0.5O2 films by millisecond flash lamp annealing
2023
·
Hideaki Tanimura
, Yuto Ota
, et al.
·
Japanese Journal of Applied Physics
·
12
Effect of Hydrophobicity and Surface Potential of Silicon on SiO2 Etching in Nanometer-Sized Narrow Spaces
2021
·
Dai Ueda
, Yousuke Hanawa
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
12
Investigation of oxygen penetration during UV nanosecond laser annealing of silicon at high energy densities
2021
·
R. Monflier
, T. Tabata
, et al.
·
Applied Surface Science
·
12
PDF
(Invited) Laser Thermal Annealing for Low Thermal Budget Applications: From Contact Formation to Material Modification
2019
·
Karim Huet
, Toshiyuki Tabata
, et al.
·
ECS Transactions
·
12
Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography
2022
·
Masahiko Harumoto
, Andreia Figueiredo dos Santos
, et al.
·
Japanese Journal of Applied Physics
·
11
Selective Wet Etching in Fabricating SiGe and Ge Nanowires for Gate-all-Around MOSFETs
2018
·
Wen Dar Liu
, Yi Chia Lee
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
11
Application of ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution/process for semiconductor lithography
2021
·
Julius Joseph Santillan
, Masahiko Harumoto
, et al.
·
Japanese Journal of Applied Physics
·
10
PDF
Cleaning of High Aspect Ratio STI Structures for Advanced Logic Devices by Implementation of a Surface Modification Drying Technique
2018
·
Farid Sebaai
, Guy Vereecke
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
10
10 nm-deep n+/p and p+/n Ge junctions with high activation formed by ion implantation and Flash Lamp Annealing (FLA)
2016
·
H. Tanimura
, H. Kawarazaki
, et al.
·
International Workshop on Junction Technology
·
10
Germanium Junctions for Beyond-Si Node Using Flash Lamp Annealing (FLA)
2017
·
H. Tanimura
, H. Kawarazaki
, et al.
·
MRS Advances
·
9
Low-thermal-budget crystallization of ferroelectric Al:HfO2 films by millisecond flash lamp annealing
2024
·
Hideaki Tanimura
, Yuma Ueno
, et al.
·
Japanese Journal of Applied Physics
·
8
Machine, process, and material efforts towards sustainable lithography
2024
·
Andreia Santos
, Wesley Zanders
, et al.
·
Advances in Patterning Materials and Processes
·
8
Breakthrough of Sublimation Drying by Liquid Phase Deposition
2021
·
Yuta Sasaki
, Yousuke Hanawa
, et al.
·
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
·
8
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Works count:
168
Citation count:
1,707
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