Source

Optical Microlithography XVIII

Source type: journal

Publisher:

Fully OA: No

DOAJ: No

OpenAlex ID: S4306521569

Resist blur and line edge roughness

2005 · Gregg M. Gallatin · Optical Microlithography XVIII · 261

Solving inverse problems of optical microlithography

2005 · Yuri Granik · Optical Microlithography XVIII · 67

Double patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ=193nm

2005 · M. Maenhoudt, J. Versluijs, et al. · Optical Microlithography XVIII · 52

Thirty years of lithography simulation

2005 · Chris A. Mack · Optical Microlithography XVIII · 48

Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm

2005 · Tim Fuhner, Andreas Erdmann · Optical Microlithography XVIII · 41

How to describe polarization influence on imaging

2005 · M. Totzeck, P. Graupner, et al. · Optical Microlithography XVIII · 30

Second generation fluids for 193 nm immersion lithography

2005 · Sheng Peng, Roger H. French, et al. · Optical Microlithography XVIII · 28

25 nm immersion lithography at 193 nm wavelength

2005 · Bruce W. Smith, Yongfa Fan, et al. · Optical Microlithography XVIII · 28

Optimized hardware and software for fast full-chip simulation

2005 · Yu Cao, Yen-Wen Lu, et al. · Optical Microlithography XVIII · 26

Modeling of electromagnetic effects from mask topography at full-chip scale

2005 · Konstantinos Adam · Optical Microlithography XVIII · 24

High-index materials for 193 nm immersion lithography

2005 · John H. Burnett, Simon G. Kaplan, et al. · Optical Microlithography XVIII · 22

Immersion lithography fluids for high NA 193 nm lithography

2005 · Jianming Zhou, Yongfa Fan, et al. · Optical Microlithography XVIII · 21

Hardness, elastic modulus, and fracture toughness bulk properties in Corning calcium fluoride

2005 · Julie L. Ladison, James J. Price, et al. · Optical Microlithography XVIII · 20

Challenges with hyper-NA (NA>1.0) polarized light lithography for sub lambda/4 resolution

2005 · Donis G. Flagello, Steven Hansen, et al. · Optical Microlithography XVIII · 18

Mask and wafer topography effects in immersion lithography

2005 · Andreas Erdmann, Peter Evanschitzky, et al. · Optical Microlithography XVIII · 18

Development of aerial image based aberration measurement technique

2005 · Tsuneyuki Hagiwara, Naoto Kondo, et al. · Optical Microlithography XVIII · 18

Aberration retrieval for high-NA optical systems using the extended Nijboer-Zernike theory

2005 · Peter Dirksen, Joseph J. Braat, et al. · Optical Microlithography XVIII · 17

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Full-field exposure tools for immersion lithography

2005 · Soichi Owa, Hiroyuki Nagasaka, et al. · Optical Microlithography XVIII · 17

Development of polarized-light illuminator and its impact

2005 · Hisashi Nishinaga, Noriaki Tokuda, et al. · Optical Microlithography XVIII · 15

High accuracy 65nm OPC verification: full process window model vs. critical failure ORC

2005 · Amandine Borjon, Jerome Belledent, et al. · Optical Microlithography XVIII · 14

Lithography enabling for the 65 nm node gate layer patterning with alternating PSM

2005 · Alexander Tritchkov, Seongtae Jeong, et al. · Optical Microlithography XVIII · 13

Determination of mask-induced polarization effects occurring in hyper NA immersion lithography

2005 · Silvio Teuber, Karsten Bubke, et al. · Optical Microlithography XVIII · 13

Investigation of polarization effects on new mask materials

2005 · Karsten Bubke, Silvio Teuber, et al. · Optical Microlithography XVIII · 13

Amphibian XIS: an immersion lithography microstepper platform

2005 · Bruce W. Smith, Anatoly Bourov, et al. · Optical Microlithography XVIII · 12

High refractive index immersion fluids for 193 nm immersion lithography

2005 · Bridgette Budhlall, Gene Parris, et al. · Optical Microlithography XVIII · 12

Works count: 178

Citation count: 1,292

H-index: 17

I10-index: 33

2yr mean citedness: