Work

EUV photomask defects: what prints, what doesn't, and what is required for HVM

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2197476

Authors: Jed Rankin, Zhengqing John Qi, Mark Lawliss, Eisuke Narita, Kazunori Seki, Karen Badger, Ravi Bonam, Scott Halle, Christina Turley

Institutions: GlobalFoundries (United States), Toppan (United States), IBM (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1851010393

FWCI: 3.747

Cites: 18

Cited by: 12

Related to: 10