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Karen D. Badger

Observed names: Badger, Karen, Karen Badger
OpenAlex ID: A5113587867
Illuminating extreme ultraviolet lithography mask defect printability
2013 · Karen D. Badger, Zhengqing J. Qi, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 15
EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection
2016 · Ravi Bonam, Hung-Yu Tien, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
EUV photomask defects: what prints, what doesn't, and what is required for HVM
2015 · Jed Rankin, Zhengqing John Qi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Illuminating EUVL mask defect printability
2012 · Karen D. Badger, Zhengqing John Qi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Printability of buried extreme ultraviolet lithography photomask defects
2016 · Kazunori Seki, Takeshi Isogawa, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 8
Impact of the OMOG substrate on 32 nm mask OPC inspectability, defect sensitivity, and mask design rule restrictions
2008 · Karen Badger, Yutaka Kodera, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Development of a new high transmission phase shift mask technology for 10 nm logic node
2016 · Thomas Faure, Yoshifumi Sakamoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Toward defect-free fabrication of extreme ultraviolet photomasks
2016 · Zhengqing John Qi, Jed H. Rankin, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 6
ENDEAVOUR to understand EUV buried defect printability
2015 · Kazunori Seki, Takeshi Isogawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Shedding light on EUV mask inspection
2012 · Kazunori Seki, Karen Badger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Wafer plane inspection evaluated for photomask production
2008 · Emily Gallagher, Karen Badger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
WEREWOLF: sensitivity optimization for early 7 nm EUV masks using an optical 19x nm inspection system
2018 · Karen D. Badger, Masashi Yonetani, et al. · SPIE Photomask Technology Conference · 5
Your worst nightmare: inspection of aggressive OPC on 14nm masks with emphasis on defect sensitivity and wafer defect print predictability
2013 · Karen D. Badger, Michael Hibbs, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Evaluation of non-actinic EUV mask inspection and defect printability on multiple EUV mask absorbers
2013 · Karen Badger, Emily Gallagher, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Generating mask inspection rules for advanced lithography
2005 · Karen Badger, Bill Broadbent, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Minimizing "Tone Reversal" during 19x nm mask inspection
2018 · Kazunori Seki, Karen Badger, et al. · Photomask and next-generation lithography mask technology. Conference · 3
Reflecting on inspectability and wafer printability of multiple EUV mask absorbers
2013 · Kazunori Seki, Karen Badger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
High resolution mask process and substrate for 20nm and early 14nm node lithography
2011 · Tom Faure, Satoshi Akutagawa, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Impact of transmitted and reflected light inspection on mask inspectability, defect sensitivity, and mask design rule restrictions
2007 · Yutaka Kodera, Karen Badger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
From nightmares to sweet dreams: inspection of aggressive OPC on 14nm reticles (and beyond) using a novel high-NA and low-NA dual method
2015 · Karen D. Badger, Michael Hibbs, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
The impact of a thinner binary mask absorber on 22nm and beyond mask inspectability and defect sensitivity
2011 · Karen D. Badger, Kazunori Seki · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Development and characterization of a thinner binary mask absorber for 22-nm node and beyond
2010 · Tom Faure, Karen Badger, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Wavelength dependent mask defects
2005 · Karen Badger, Shahid Butt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Design to silicon flow challenges for silicon photonics (Conference Presentation)
2019 · Ian Stobert, Karen Badger, et al. · SPIE Photomask Technology Conference · 1
The study of relationship between defect sensitivity and inspectability on EUV masks with 19x nm mask inspection
2019 · Masashi Yonetani, Karen D. Badger, et al. · Photomask and next-generation lithography mask technology. Conference · 1
Works count: 32
Citation count: 140
H-index: 6
I10-index: 4
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