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Wafer plane inspection evaluated for photomask production

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.801945

Authors: Emily Gallagher, Karen Badger, Mark Lawliss, Yutaka Kodera, Jaione Tirapu Azpiroz, Song Pang, Hongqin Zhang, Eugenia Eugenieva, Chris Clifford, Arosha Goonesekera, Yibin Tian

Institutions: IBM (United States), Toppan (United States), KLA (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2045238654

FWCI: 1.419

Cites: 5

Cited by: 6

Related to: 10