Work

Metal film protection of CMOS wafers against KOH

Year: 2002

Type: conference-paper

Source: IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

DOI: 10.1109/memsys.2000.838587

Authors: U. Munch, O. Brand, O. Paul, H. Baltes, M. Bossel

Institutions: ETH Zurich, University of Freiburg

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1948033074

FWCI: 0.711

Cites: 8

Cited by: 6

Related to: 10