Work

Modeling physical limitations on junction scaling for CMOS

Year: 1984

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/t-ed.1984.21685

Authors: R.B. Fair, J.J. Wortman, Jiann Liu, M. Tischler, N.A. Masnari

Institutions: MCNC Research and Development Institute, North Carolina State University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1968483754

FWCI: 1.714

Cites: 1

Cited by: 4

Related to: 10