Work

Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.389028

Authors: Michael Fritze, James M. Burns, Peter W. Wyatt, David K. Astolfi, T. Forte, Donna Yost, Paul Davis, Andrew V. Curtis, Douglas M. Preble, Susan G. Cann, Sandy Denault, Hua-Yu Liu, Joe C. Shaw, Neal T. Sullivan, Robert Brandom, Martin E. Mastovich

Institutions: MIT Lincoln Laboratory, Schlumberger (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1980252523

FWCI: 4.779

Cites:

Cited by: 6

Related to: 10