Author

Susan G. Cann

Observed names: S. Cann, S. G. Cann, S.G. Cann, Susan Cann

Institutions: MIT Lincoln Laboratory, Massachusetts Institute of Technology

Observed institutions: MIT Lincoln Laboratory, Massachusetts Institute of Technology

OpenAlex ID: A5052145337

A Nanoparticle Convective Directed Assembly Process for the Fabrication of Periodic Surface Enhanced Raman Spectroscopy Substrates

2010 · V. Liberman, C. Yilmaz, et al. · Advanced Materials · 106

Line-edge roughness in sub-0.18-μm resist patterns

1998 · Susan C. Palmateer, Susan G. Cann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 70

Hybrid optical maskless lithography: Scaling beyond the 45nm node

2005 · M. Fritze, T. M. Bloomstein, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 27

OMVPE growth of highly strain-balanced GaInAs/AlInAs/InP for quantum cascade lasers

2008 · C.A. Wang, R.K. Huang, et al. · Journal of Crystal Growth · 22

Subwavelength Optical Lithography with Phase-Shift Photomasks

2003 · M. Fritze, Brian Tyrrell, et al. · 20

Dry etching of amorphous-Si gates for deep sub-100 nm silicon-on-insulator complementary metal–oxide semiconductor

2002 · D. Yost, T. Forte, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 13

Direct patterning of spin-on glass with 157nm lithography: Application to nanoscale crystal growth

2005 · T. M. Bloomstein, P. W. Juodawlkis, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 12

Contributions of resist polymers to innate material roughness

2008 · Theodore H. Fedynyshyn, David K. Astolfi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 11

Component segregation in model chemically amplified resists

2007 · John T. Woodward, Theodore H. Fedynyshyn, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography

2001 · M. Fritze, B. Tyrrell, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 11

100-nm node lithography with KrF?

2001 · Michael Fritze, Brian Tyrrell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Sub-100 nm silicon on insulator complimentary metal–oxide semiconductor transistors by deep ultraviolet optical lithography

2000 · M. Fritze, J. Burns, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 11

Monolithic 3.3 V CCD/SOI-CMOS imager technology

2002 · V. Suntharalingam, B. Burke, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 9

How practical is 193 nm lithography?

1996 · M. Rothschild, J. A. Burns, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 8

PAG segregation during exposure affecting innate material roughness

2009 · Theodore H. Fedynyshyn, David K. Astolfi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

2000 · Michael Fritze, James M. Burns, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Performance of a low power fully-depleted deep submicron SOI technology and its extension to 0.15 μm

2002 · J.A. Burns, C.L. Keast, et al. · IEEE International SOI Conference (SOI) · 5

Metrology methods for quantifying edge roughness: II

1999 · Carla M. Nelson-Thomas, Susan C. Palmateer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Attenuating phase-shifting mask at 157 nm

2002 · Vladimir Liberman, Mordechai Rothschild, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Nanofabrication with deep-ultraviolet lithography and resolution enhancements

1999 · M. Fritze, S. Palmateer, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3

Nanoscale selective area epitaxy: towards lithographically defined quantum dots at 1.5 /spl mu/m using direct lithographic patterning

2005 · R.B. Swint, P.W. Juodawlkis, et al. · IEEE Lasers and Electro-Optics Society Annual Meeting (LEOS) · 2

Minimization of image placement errors in chromeless phase-shift mask lithography

2002 · Michael Fritze, Brian Tyrrell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Application of attenuated phase-shift masks to sub-0.18-μm logic patterns

2000 · Michael Fritze, Peter W. Wyatt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Pattern asymmetries in phase-edge imaging

1999 · Michael Fritze, Susan G. Cann, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Resist roughness bi-modality as revealed by two-dimensional FFT 2D analysis

2009 · Yehiel Gotkis, Leonid Baranov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

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Works count: 29

Citation count: 376

H-index: 11

I10-index: 12