Reflective masks for 1X deep ultraviolet lithography
Year: 1992
Type: conference-paper
DOI: 10.1117/12.56936
Authors: Robert L. Hsieh, Julienne Y. Lee, Nadim I. Maluf, Raymond Browning, Paul Jerabek, Roger Fabian W. Pease, Gerry Owen
Institutions: Stanford University, Hewlett-Packard (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1984208175