Work

Templated Self‐Assembly of Block Copolymers: Effect of Substrate Topography

Year: 2003

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.200305244

Authors: J.Y. Cheng, C.A. Ross, E.L. Thomas, H.I. Smith, G.J. Vancso

Institutions: Massachusetts Institute of Technology, U.S. National Science Foundation, Max-Planck-Institut für Kohlenforschung, University of Twente

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1988111430

FWCI: 9.882

Cites: 34

Cited by: 235

Related to: 10