Author

Joy Y. Cheng

Observed names: J. Y. Cheng, J.Y. Cheng, J. Y. Cheng, Joy Cheng, Joy Y Cheng

Institutions: IBM Research - Almaden, Taiwan Semiconductor Manufacturing Company (Taiwan)

Observed institutions: IBM (United States), IBM Research - Almaden, IBM Research - Thomas J. Watson Research Center, Taiwan Semiconductor Manufacturing Company (Taiwan), IBM Research - Albany, Massachusetts Institute of Technology

OpenAlex ID: A5111535229

Nanostructure engineering by templated self-assembly of block copolymers

2004 · Joy Y. Cheng, Anne M. Mayes, et al. · Nature Materials · 721

Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up

2006 · J. Y. Cheng, C. A. Ross, et al. · Advanced Materials · 703

Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

2001 · J.Y. Cheng, C.A. Ross, et al. · Advanced Materials · 676

Fabrication of nanostructures with long-range order using block copolymer lithography

2002 · J. Y. Cheng, C. A. Ross, et al. · Applied Physics Letters · 420

Polymer self assembly in semiconductor microelectronics

2007 · C. T. Black, R. Ruiz, et al. · IBM Journal of Research and Development · 411

Dense Self‐Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers

2008 · Joy Y. Cheng, Charles T. Rettner, et al. · Advanced Materials · 318

Micromagnetic behavior of electrodeposited cylinder arrays

2002 · C. A. Ross, M. Hwang, et al. · Physical review. B, Condensed matter · 259

Templated Self‐Assembly of Block Copolymers: Effect of Substrate Topography

2003 · J.Y. Cheng, C.A. Ross, et al. · Advanced Materials · 235

Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

2010 · Joy Y. Cheng, Daniel P. Sanders, et al. · ACS Nano · 226

Three‐Dimensional Nanofabrication by Block Copolymer Self‐Assembly

2014 · Caroline A. Ross, Karl K. Berggren, et al. · Advanced Materials · 173

Two-Dimensional Pattern Formation Using Graphoepitaxy of PS‑ b ‑PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

2014 · Hsinyu Tsai, Jed W. Pitera, et al. · ACS Nano · 169

Magnetic behavior of lithographically patterned particle arrays (invited)

2002 · C. A. Ross, S. Haratani, et al. · Journal of Applied Physics · 130

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

2011 · Chris Bencher, Jeffrey Smith, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 106

Facile postpolymerization end‐modification of RAFT polymers

2008 · Jason M. Spruell, Benjamin A. Levy, et al. · Journal of Polymer Science Part A Polymer Chemistry · 95

Si-containing block copolymers for self-assembled nanolithography

2008 · C. A. Ross, Y. S. Jung, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 83

Self-Assembled One-Dimensional Nanostructure Arrays

2006 · Joy Y. Cheng, Feng Zhang, et al. · Nano Letters · 82

Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films

2015 · Michael J. Maher, Charles T. Rettner, et al. · ACS Applied Materials & Interfaces · 79

Patterned Magnetic Media Made by Self-Assembled Block-Copolymer Lithography

2008 · C.A. Ross, J.Y. Cheng · MRS Bulletin · 74

Directed self-assembly defectivity assessment. Part II

2012 · Chris Bencher, He Yi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 69

Determination of the Internal Morphology of Nanostructures Patterned by Directed Self Assembly

2014 · Daniel F. Sunday, Matthew R. Hammond, et al. · ACS Nano · 68

Double textured cylindrical block copolymer domains via directional solidification on a topographically patterned substrate

2001 · Cheolmin Park, Joy Y. Cheng, et al. · Applied Physics Letters · 68

Pattern Registration Between Spherical Block‐Copolymer Domains and Topographical Templates

2006 · J. Y. Cheng, F. Zhang, et al. · Advanced Materials · 66

Magnetic nanostructures from block copolymer lithography: Hysteresis, thermal stability, and magnetoresistance

2004 · J. Y. Cheng, W. Jung, et al. · Physical Review B · 65

Enabling complex nanoscale pattern customization using directed self-assembly

2014 · Gregory S. Doerk, Joy Y. Cheng, et al. · Nature Communications · 64

Three-Dimensional Self-Assembly of Spherical Block Copolymer Domains into V-Shaped Grooves

2006 · Vivian P. Chuang, Joy Y. Cheng, et al. · Nano Letters · 62

Works count: 82

Citation count: 6,200

H-index: 32

I10-index: 51