Work

Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography

Year: 2001

Type: article

Source: Advanced Materials

DOI: 10.1002/1521-4095(200108)13:15<1174::aid-adma1174>3.0.co;2-q

Authors: J.Y. Cheng, C.A. Ross, V.Z.-H. Chan, E.L. Thomas, R.G.H. Lammertink, G.J. Vancso

Institutions: Massachusetts Institute of Technology, California Institute of Technology, University of Twente

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2093640652

FWCI: 22.47

Cites: 3

Cited by: 676

Related to: 10