3D Monte Carlo modeling of the SEM: Are there applications to photomask metrology?
Year: 2014
Type: conference-paper
DOI: 10.1117/12.2069324
Authors: J. S. Villarrubia, A. E. Vladár, M. T. Postek
Institution: National Institute of Standards and Technology
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1989030508