High quality r.f. sputtered metal oxides (Ta2O5, HfO2) and their properties after annealing
Year: 2004
Type: article
Source: Thin Solid Films
Authors: H. Grüger, Ch. Kunath, E. Kurth, S. Sorge, W. Pufe, T. Pechstein
Institution: Fraunhofer Institute for Photonic Microsystems
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1995382460