Work

Pushing multiple patterning in sub-10nm

Year: 2015

Type: conference-paper

Source: ACM/IEEE Design Automation Conference (DAC)

DOI: 10.1145/2744769.2747940

Authors: David Z. Pan, Lars Liebmann, Bei Yu, Xiaoqing Xu, Yibo Lin

Institutions: The University of Texas at Austin, IBM (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W1996055445

FWCI: 7.494

Cites: 59

Cited by: 39

Related to: 10