Reducing capital and labor costs of 193nm lithography monitoring of airborne molecular contamination (AMC) through proactive assessment and implementation of AMC monitoring techniques and strategies
Year: 2008
Type: conference-paper
DOI: 10.1117/12.803919
Authors: Steven Rowley, Jerry Yang, Andy Wei
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1998581252