Work

SiO2/Si(100) interface studied by Al Kα x-ray and synchrotron radiation photoelectron spectroscopy

Year: 1993

Type: article

Source: Applied Physics Letters

DOI: 10.1063/1.110279

Authors: Z. H. Lu, M. J. Graham, D. T. Jiang, K. H. Tan

Institutions: Institute for Microstructural Sciences, National Research Council Canada, Western University

Language: English

Topic: Electron and X-Ray Spectroscopy Techniques

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2001440827

FWCI: 6.397

Cites: 9

Cited by: 162

Related to: 10