Work

Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Year: 2001

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.435723

Authors: Jan B. van Schoot, Nakgeuon Seong, Bernd Geh, Martin Burkhardt, Paul Graeupner, Gerd Reisinger, Rian Rubingh, Manfred Suddendorf, Jo Finders, Erwin Rikkers

Institutions: ASML (Netherlands), Samsung (United States), Carl Zeiss (United States), ASML (United States), Carl Zeiss (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2007625801

FWCI: 0.865

Cites:

Cited by: 4

Related to: 10