Author

Jan B. van Schoot

Observed institution: ASML (Netherlands)

OpenAlex ID: A5110045272

Mask error factor: causes and implications for process latitude

1999 · Jan B. van Schoot, Jo Finders, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 28

Optimizing and enhancing optical systems to meet the low k 1 challenge

2003 · Donis G. Flagello, Robert J. Socha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24

Performance of a step-and-scan system for DUV lithography

1997 · Gerard de Zwart, Martin A. van den Brink, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24

CD uniformity improvement by active scanner corrections

2002 · Jan B. van Schoot, Oscar Noordman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

Understanding systematic and random CD variations using predictive modeling techniques

1999 · Donis G. Flagello, Hans van der Laan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

Aberration sensitivity control for the isolation layer in low-k1 DRAM process

2002 · Byeong-Ho Cho, Donggyu Yim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

2001 · Jan B. van Schoot, Nakgeuon Seong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Analysis of full-wafer/full-batch CD uniformity using electrical linewidth measurements

2001 · Peter Vanoppen, Oscar Noordman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

0.7-NA DUV step-and-scan system for 150-nm imaging with improved overlay

1999 · Jan B. van Schoot, Frank Bornebroek, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-μm gate printing

1998 · Kurt G. Ronse, Mireille Maenhoudt, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Demonstrating next-generation CD uniformity with today's tools and processes

1997 · Jacques A. Waelpoel, Jan B. van Schoot, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Can DUV take us below 100 nm?

2001 · Jo Finders, Louis Jorritsma, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

KrF lithography for 130 nm

2000 · Jo Finders, Jan B. van Schoot, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Reticle error correction for lithography tool qualification benefits and limitations

2001 · Ton Kiers, Melchior Mulder, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Works count: 14

Citation count: 151

H-index: 5

I10-index: 5