Work

KrF lithography for 130 nm

Year: 2000

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.389002

Authors: Jo Finders, Jan B. van Schoot, Peter Vanoppen, Mircea V. Dusa, Robert J. Socha, Geert Vandenberghe, Kurt G. Ronse

Institutions: ASML (Netherlands), ASML (United States), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2000620740

FWCI: 0.969

Cites: 5

Cited by: 3

Related to: 10