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Optimizing and enhancing optical systems to meet the low k 1 challenge

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Year: 2003
Type: conference-paper
Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
DOI: 10.1117/12.485340
Authors: Donis G. Flagello, Robert J. Socha, Xuelong Shi, Jan B. van Schoot, Jan Baselmans, Mark A. van de Kerkhof, Wim de Boeij, Andre Engelen, Rene Carpaij, Oscar Noordman, Marco H. P. Moers, Melchior Mulder, Jo Finders, Henk van Greevenbroek, Martin Schriever, Manfred Maul, Helmut Haidner, Markus Goeppert, Ulrich Wegmann, Paul Graeupner
Institutions: ASML (United States), ASML (Netherlands), Carl Zeiss (Germany)
Language: English

Topic: Advancements in Photolithography Techniques
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences

Open Access status: closed
OpenAlex ID: W1997131777
FWCI: 2.691
Cites: 8
Cited by: 24
Related to: 10
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