Work

CD uniformity improvement by active scanner corrections

Year: 2002

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.474579

Authors: Jan B. van Schoot, Oscar Noordman, Peter Vanoppen, Frans Blok, Donggyu Yim, Chan-Ha Park, Byeong-Ho Cho, Thomas Theeuwes, Young-Hong Min

Institutions: ASML (Netherlands), SK Hynix (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2043733717

FWCI: 1.502

Cites:

Cited by: 22

Related to: 10