Author

Thomas Theeuwes

Observed institution: ASML (Netherlands)

OpenAlex ID: A5014412923

CD uniformity improvement by active scanner corrections

2002 · Jan B. van Schoot, Oscar Noordman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22

Lithographic scanner stability improvements through advanced metrology and control

2010 · Peter Vanoppen, Thomas Theeuwes, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

2015 · Hong-Goo Lee, Emil Schmitt-Weaver, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

Study of iso-dense bias (IDB) sensitivity to laser spectral shape at the 45nm node

2007 · Kazuyuki Yoshimochi, Takayuki Uchiyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield

2009 · Shmoolik Mangan, Erik Byers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Aberration sensitivity control for the isolation layer in low-k1 DRAM process

2002 · Byeong-Ho Cho, Donggyu Yim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Mixed-mode, high-order multi-patterning control strategy with small-spot, optical CD metrology on device structures

2016 · Hugo Cramer, Baukje Wisse, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Utilization of Insitu Metrology Capability of ASML Lithography Scanner to Improve Overall Process Control

2006 · Alek Chen, Mircea Dusa, et al. · IEEE International Symposium on Semiconductor Manufacturing conference proceedings · 3

Spacer multi-patterning control strategy with optical CD metrology on device structures

2016 · Jongsu Lee, Byoung-Hoon Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Characteristics analysis of polarization module on optical proximity effect

2007 · Chanha Park, Jongkyun Hong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 10

Citation count: 79

H-index: 5

I10-index: 3