Spacer multi-patterning control strategy with optical CD metrology on device structures
Year: 2016
Type: conference-paper
DOI: 10.1117/12.2219664
Authors: Jongsu Lee, Byoung-Hoon Lee, Won-Kwang Ma, Sang-Jun Han, Young-Sik Kim, Noh-Jung Kwak, Thomas Theeuwes, Wei Guo, Yi Song, Baukje Wisse, Stefan Kruijswijk, Hugo Cramer, Steven Welch, Alok Verma, Rui Zhang, Yvon Chai, Sharon Hsu, Giacomo Miceli, Kyu-Tae Sun, Jin-Moo Byun
Institutions: SK Hynix (South Korea), ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2295862005