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Kyu-Tae Sun
Observed institution:
ASML (Netherlands)
OpenAlex ID:
A5113580441
Improving full-wafer on-product overlay using computationally designed process-robust and device-like metrology targets
2015
·
Young-Sik Kim
, Young-Sun Hwang
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
20
Virtual overlay metrology for fault detection supported with integrated metrology and machine learning
2015
·
Hong-Goo Lee
, Emil Schmitt-Weaver
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
15
Understanding of stochastic noise
2015
·
Seo-Min Kim
, Chang-Moon Lim
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
12
Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements
2016
·
Min-Suk Kim
, Hwa-Yeon Won
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Mixed-mode, high-order multi-patterning control strategy with small-spot, optical CD metrology on device structures
2016
·
Hugo Cramer
, Baukje Wisse
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
3
Spacer multi-patterning control strategy with optical CD metrology on device structures
2016
·
Jongsu Lee
, Byoung-Hoon Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Reduction of in-lot overlay variation with integrated metrology, and a holistic control strategy
2015
·
Hong-Goo Lee
, Sang-Jun Han
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
CD uniformity optimization at volume ramp up stage for new product introduction
2014
·
Jin-Soo Kim
, Won-Kwang Ma
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
OPC optimization techniques for enabling the reduction of mismatch between overlay metrology and the device pattern cell
2016
·
Shinyoung Kim
, Chanha Park
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Improvement of the process overlay control for sub-40-nm DRAM
2010
·
Sarohan Park
, Eun-Ha Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Applications of MoSi-based binary intensity mask for sub-40nm DRAM
2010
·
Tae-Seung Eom
, Eun-Kyoung Shin
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Synthesis of $\beta$-$Ga_2$$O_3 Nanobelts and Nanoparticles from Mechanically Ground GaN Powders with Different Thermal Annealing Atmospheres
2001
·
Byungcheul Kim
, Kyu-Tae Sun
, et al.
·
Journal of the Korean Institute of Electrical and Electronic Material Engineers
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Works count:
12
Citation count:
61
H-index:
4
I10-index:
3
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