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Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.815415

Authors: Shmoolik Mangan, Erik Byers, Dan Rost, Mike Garrett, Merri Carlson, Craig Hickman, Jo Finders, Paul Luehrmann, Robert Kazinczi, Ingrid Minnaert-Janssen, Frank Duray, Baukje Wisse, Nicole Schoumans, Liesbeth Reijnen, Thomas Theeuwes, Michael Ben-Yishai, Rachel Ren, Ryan Gibson, Lior Shoval, Yaron Cohen, Yair Elblinger, Ilan Englard

Institutions: Applied Materials (Israel), Micron (United States), MP Technologies (United States), ASML (Netherlands), Applied Materials (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2072073646

FWCI: 0.469

Cites: 3

Cited by: 6

Related to: 10